Size effect in tension of thin films on substrate: A study based on the reformulation of mechanism-based strain gradient plasticity

G. Yun, K. C. Hwang, Y. Huang*, P. D. Wu, C. Liu

*Corresponding author for this work

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

We have used the type-II strain gradient plasticity theory, based on the Taylor dislocation model, to study the size effect in uniaxial tension experiments of a copper thin film on a Kapton substrate. There are two contributing mechanisms to the size effect in uniaxial tension of thin film on substrate. One is the strain gradient effect associated with the higher-order boundary condition, and the other is the substrate constraint effect on the yield stress. It is shown that the latter dominates the contribution to the size effect in uniaxial tension of thin film on substrate.

Original languageEnglish (US)
Pages (from-to)5553-5566
Number of pages14
JournalPhilosophical Magazine
Volume86
Issue number33-35 SPEC. ISSUE
DOIs
StatePublished - Nov 21 2006

ASJC Scopus subject areas

  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Size effect in tension of thin films on substrate: A study based on the reformulation of mechanism-based strain gradient plasticity'. Together they form a unique fingerprint.

  • Cite this