Soft lithography using acryloxy perfluoropolyether composite stamps

Tu T. Truong, Rongsheng Lin, Seokwoo Jeon, Hee Hyun Lee, Joana Maria, Anshu Gaur, Feng Hua, Ines Meinel, John A. Rogers*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

122 Scopus citations

Abstract

This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm -1), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS).

Original languageEnglish (US)
Pages (from-to)2898-2905
Number of pages8
JournalLangmuir
Volume23
Issue number5
DOIs
StatePublished - Feb 27 2007

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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