Solvent Engineering of Colloidal Quantum Dot Inks for Scalable Fabrication of Photovoltaics

Jonghee Yang, Minseon Kim, Seungjin Lee, Jung Won Yoon, Sanchari Shome, Koen Bertens, Hochan Song, Seul Gi Lim, Jae Taek Oh, Sung Yong Bae, Bo Ram Lee, Whikun Yi*, Edward H. Sargent, Hyosung Choi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Scopus citations


Development of colloidal quantum dot (CQD) inks enables single-step spin-coating of compact CQD films of appropriate thickness, enabling the promising performance of CQD photovoltaics (CQDPVs). Today's highest-performing CQD inks rely on volatile n-butylamine (BTA), but it is incompatible with scalable deposition methods since a rapid solvent evaporation results in irregular film thickness with an uneven surface. Here, we present a hybrid solvent system, consisting of BTA and N,N-dimethylformamide, which has a favorable acidity for colloidal stability as well as an appropriate vapor pressure, enabling a stable CQD ink that can be used to fabricate homogeneous, large-area CQD films via spray-coating. CQDPVs fabricated with the CQD ink exhibit suppressed charge recombination as well as fast charge extraction compared with conventional CQD ink-based PVs, achieving an improved power conversion efficiency (PCE) of 12.22% in spin-coated devices and the highest ever reported PCE of 8.84% among spray-coated CQDPVs.

Original languageEnglish (US)
Pages (from-to)36992-37003
Number of pages12
JournalACS Applied Materials and Interfaces
Issue number31
StatePublished - Aug 11 2021


  • Lewis acid
  • Lewis base
  • colloidal quantum dot
  • large-area photovoltaics
  • solvent engineering
  • spray-coating

ASJC Scopus subject areas

  • General Materials Science


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