Spontaneous Formation of Ordered Magnetic Domains by Patterning Stress

Jian Zhang; Won Kyu Lee; Rui Tu; Dongjoon Rhee; Rongzhi Zhao; Xinyu Wang; Xiaolian Liu; Xin Hu; Xuefeng Zhang; Teri W. Odom; Xuefeng Zhang; Mi Yan

doi:10.1021/acs.nanolett.1c00070

Spontaneous Formation of Ordered Magnetic Domains by Patterning Stress

Jian Zhang, Won Kyu Lee, Rui Tu, Dongjoon Rhee, Rongzhi Zhao, Xinyu Wang, Xiaolian Liu, Xin Hu, Xuefeng Zhang, Teri W. Odom, Xuefeng Zhang, Mi Yan

Chemistry

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

The formation of ordered magnetic domains in thin films is important for the magnetic microdevices in spin-electronics, magneto-optics, and magnetic microelectromechanical systems. Although inducing anisotropic stress in magnetostrictive materials can achieve the domain assembly, controlling magnetic anisotropy over microscale areas is challenging. In this work, we realized the microscopic patterning of magnetic domains by engineering stress distribution. Deposition of ferromagnetic thin films on nanotrenched polymeric layers induced tensile stress at the interfaces, giving rise to the directional magnetoelastic coupling to form ordered domains spontaneously. By changing the periodicity and shape of nanotrenches, we spatially tuned the geometric configuration of domains by design. Theoretical analysis and micromagnetic characterization confirmed that the local stress distribution by the topographic confinement dominates the forming mechanism of the directed magnetization.

Original language	English (US)
Pages (from-to)	5430-5437
Number of pages	8
Journal	Nano letters
Volume	21
Issue number	12
DOIs	https://doi.org/10.1021/acs.nanolett.1c00070
State	Published - Jun 23 2021

Keywords

Directed assembly
Magnetic domain
Magnetoelastic coupling
Magnetostrictive effect
Stress engineering

ASJC Scopus subject areas

Bioengineering
Chemistry(all)
Materials Science(all)
Condensed Matter Physics
Mechanical Engineering

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10.1021/acs.nanolett.1c00070

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title = "Spontaneous Formation of Ordered Magnetic Domains by Patterning Stress",

abstract = "The formation of ordered magnetic domains in thin films is important for the magnetic microdevices in spin-electronics, magneto-optics, and magnetic microelectromechanical systems. Although inducing anisotropic stress in magnetostrictive materials can achieve the domain assembly, controlling magnetic anisotropy over microscale areas is challenging. In this work, we realized the microscopic patterning of magnetic domains by engineering stress distribution. Deposition of ferromagnetic thin films on nanotrenched polymeric layers induced tensile stress at the interfaces, giving rise to the directional magnetoelastic coupling to form ordered domains spontaneously. By changing the periodicity and shape of nanotrenches, we spatially tuned the geometric configuration of domains by design. Theoretical analysis and micromagnetic characterization confirmed that the local stress distribution by the topographic confinement dominates the forming mechanism of the directed magnetization.",

keywords = "Directed assembly, Magnetic domain, Magnetoelastic coupling, Magnetostrictive effect, Stress engineering",

author = "Jian Zhang and Lee, {Won Kyu} and Rui Tu and Dongjoon Rhee and Rongzhi Zhao and Xinyu Wang and Xiaolian Liu and Xin Hu and Xuefeng Zhang and Odom, {Teri W.} and Xuefeng Zhang and Mi Yan",

note = "Funding Information: The authors thank Prof. Houbing Huang (at Advanced Research Institute of Multidisciplinary Science, Beijing Institute of Technology) for assisting in theoretical simulation, and Prof. Tiejun Zhou and Dr. Yongming Luo (at College of Electronics and Information, Hangzhou Dianzi University) for ultrahigh-vacuum sputtering. The authors thank the supports from the Institute of Advanced Magnetic Materials (Hangzhou Dianzi University) and the Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province (Xihu University). The authors gratefully acknowledge National Key Scientific Instrument and Equipment Development Project of China (51927802), National Natural Science Foundation of China (U1704253 and 51471045), Zhejiang Provincial Key Research and Development Program (2019C01121), and the Key Laboratory of New Energy and Rare Earth Resource Utilization of State Ethnic Affairs Commission (NERE201907). Publisher Copyright: {\textcopyright} ",

year = "2021",

month = jun,

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doi = "10.1021/acs.nanolett.1c00070",

language = "English (US)",

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journal = "Nano Letters",

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publisher = "American Chemical Society",

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T1 - Spontaneous Formation of Ordered Magnetic Domains by Patterning Stress

AU - Zhang, Jian

AU - Lee, Won Kyu

AU - Tu, Rui

AU - Rhee, Dongjoon

AU - Zhao, Rongzhi

AU - Wang, Xinyu

AU - Liu, Xiaolian

AU - Hu, Xin

AU - Zhang, Xuefeng

AU - Odom, Teri W.

AU - Zhang, Xuefeng

AU - Yan, Mi

N1 - Funding Information: The authors thank Prof. Houbing Huang (at Advanced Research Institute of Multidisciplinary Science, Beijing Institute of Technology) for assisting in theoretical simulation, and Prof. Tiejun Zhou and Dr. Yongming Luo (at College of Electronics and Information, Hangzhou Dianzi University) for ultrahigh-vacuum sputtering. The authors thank the supports from the Institute of Advanced Magnetic Materials (Hangzhou Dianzi University) and the Key Laboratory of 3D Micro/Nano Fabrication and Characterization of Zhejiang Province (Xihu University). The authors gratefully acknowledge National Key Scientific Instrument and Equipment Development Project of China (51927802), National Natural Science Foundation of China (U1704253 and 51471045), Zhejiang Provincial Key Research and Development Program (2019C01121), and the Key Laboratory of New Energy and Rare Earth Resource Utilization of State Ethnic Affairs Commission (NERE201907). Publisher Copyright: ©

PY - 2021/6/23

Y1 - 2021/6/23

N2 - The formation of ordered magnetic domains in thin films is important for the magnetic microdevices in spin-electronics, magneto-optics, and magnetic microelectromechanical systems. Although inducing anisotropic stress in magnetostrictive materials can achieve the domain assembly, controlling magnetic anisotropy over microscale areas is challenging. In this work, we realized the microscopic patterning of magnetic domains by engineering stress distribution. Deposition of ferromagnetic thin films on nanotrenched polymeric layers induced tensile stress at the interfaces, giving rise to the directional magnetoelastic coupling to form ordered domains spontaneously. By changing the periodicity and shape of nanotrenches, we spatially tuned the geometric configuration of domains by design. Theoretical analysis and micromagnetic characterization confirmed that the local stress distribution by the topographic confinement dominates the forming mechanism of the directed magnetization.

AB - The formation of ordered magnetic domains in thin films is important for the magnetic microdevices in spin-electronics, magneto-optics, and magnetic microelectromechanical systems. Although inducing anisotropic stress in magnetostrictive materials can achieve the domain assembly, controlling magnetic anisotropy over microscale areas is challenging. In this work, we realized the microscopic patterning of magnetic domains by engineering stress distribution. Deposition of ferromagnetic thin films on nanotrenched polymeric layers induced tensile stress at the interfaces, giving rise to the directional magnetoelastic coupling to form ordered domains spontaneously. By changing the periodicity and shape of nanotrenches, we spatially tuned the geometric configuration of domains by design. Theoretical analysis and micromagnetic characterization confirmed that the local stress distribution by the topographic confinement dominates the forming mechanism of the directed magnetization.

KW - Directed assembly

KW - Magnetic domain

KW - Magnetoelastic coupling

KW - Magnetostrictive effect

KW - Stress engineering

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JO - Nano Letters

JF - Nano Letters

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ER -

Spontaneous Formation of Ordered Magnetic Domains by Patterning Stress

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Keywords

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