Stabilization of β-SiB3 from liquid Ga: A boron-rich binary semiconductor resistant to high-temperature air oxidation

James R. Salvador, Daniel Bilc, S. D. Mahanti, Mercouri G. Kanatzidis*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

Unlike the original form of SiB3, which has a huge compositional spread in its Si/B ratio and a crystal structure with Si atoms randomly distributed over all its B12 cages, the new form of SiB3 (β form; see structure) is stoichiometrically and crystallographically ordered. The clear segregation of Si and B atoms in the new form is believed to be responsible for its enhanced oxidation resistance observed at high temperatures.

Original languageEnglish (US)
Pages (from-to)1929-1932
Number of pages4
JournalAngewandte Chemie - International Edition
Volume42
Issue number17
DOIs
StatePublished - Apr 29 2003

Keywords

  • Boron
  • Gallium
  • Semiconductors
  • Silicon

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)

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