Stabilization of copper catalysts for liquid-phase reactions by atomic layer deposition

Brandon J. O'Neill, David H.K. Jackson, Anthony J. Crisci, Carrie A. Farberow, Fengyuan Shi, Ana C. Alba-Rubio, Junling Lu, Paul J. Dietrich, Xiangkui Gu, Christopher L. Marshall, Peter Stair, Jeffrey W. Elam, Jeffrey T. Miller, Fabio H. Ribeiro, Paul M. Voyles, Jeffrey Greeley, Manos Mavrikakis, Susannah L. Scott, Thomas F. Kuech, James A. Dumesic

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Engineering & Materials Science

Chemical Compounds