Engineering
III-V Semiconductor
100%
Integrated Optoelectronics
100%
Thin Films
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Broad Range
16%
Nanometre
16%
Film Quality
16%
Great Extent
16%
Main Reason
16%
Graded Index
16%
Growth Method
16%
Photonics
16%
Quantum Well
16%
Planar Structure
16%
Superlattice
16%
Band Gap
16%
Mass Production
16%
Keyphrases
Semiconductor Thin Films
100%
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
III-V Semiconductors
100%
Overgrowth
16%
Large-scale Production
16%
Molecular Beam Epitaxy
16%
Superlattices
16%
Patterned Substrate
16%
Growth Rate
16%
Band Gap
16%
Compositional Uniformity
16%
Quantum Well
16%
Photonics
16%
Epitaxial Growth
16%
Semiconductor Technology
16%
Simultaneous Growth
16%
Growth Method
16%
Growth Techniques
16%
Epitaxy
16%
Atomically Flat
16%
Nanometre
16%
Semiconductor Films
16%
Graded-index
16%
Flat Interface
16%
Laser Device
16%
Planar Structure
16%
Discrete Device
16%
Material Science
III-V Semiconductor
100%
Chemical Vapor Deposition
100%
Thin Films
100%
Epitaxy
33%
Film
33%
Superlattice
16%
Molecular Beam Epitaxy
16%
Quantum Well
16%