Stiction Problems in Releasing of 3D Microstructures and Its Solution

Dongmin Wu; Nicholas Fang; Cheng Sun; Xiang Zhang

doi:10.1117/12.506644

Stiction Problems in Releasing of 3D Microstructures and Its Solution

Dongmin Wu^*, Nicholas Fang, Cheng Sun, Xiang Zhang

^*Corresponding author for this work

Mechanical Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

Micro-stereolithography (μSL) is capable of fabrication of highly complex three-dimensional (3D) microstructures by selectively photo-induced polymerization from the monomer resin. However, during the evaporative drying of structures from liquid resin, the 3D microstructures often collapse due to the capillary force. In this work, a theoretical model is developed to analyze the deflection and adhesion between thin polymer beams under capillary force. The detachment length of the test structures and adhesion energy of a typical μSL polymer (HDDA) are obtained experimentally which are important for MEMS structure design. Finally, we successfully developed a sublimation process to release the 3D microstructures without the adhesion.

Original language	English (US)
Pages (from-to)	40-48
Number of pages	9
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5225
DOIs	https://doi.org/10.1117/12.506644
State	Published - 2003
Event	Nano- and Micro-Optics for Information Systems - San Diego, CA, United States Duration: Aug 3 2003 → Aug 4 2003

Keywords

MEMS
Micro stereolithography
Photo polymerization
Polymer
Surface tension

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.506644

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title = "Stiction Problems in Releasing of 3D Microstructures and Its Solution",

abstract = "Micro-stereolithography (μSL) is capable of fabrication of highly complex three-dimensional (3D) microstructures by selectively photo-induced polymerization from the monomer resin. However, during the evaporative drying of structures from liquid resin, the 3D microstructures often collapse due to the capillary force. In this work, a theoretical model is developed to analyze the deflection and adhesion between thin polymer beams under capillary force. The detachment length of the test structures and adhesion energy of a typical μSL polymer (HDDA) are obtained experimentally which are important for MEMS structure design. Finally, we successfully developed a sublimation process to release the 3D microstructures without the adhesion.",

keywords = "MEMS, Micro stereolithography, Photo polymerization, Polymer, Surface tension",

author = "Dongmin Wu and Nicholas Fang and Cheng Sun and Xiang Zhang",

year = "2003",

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language = "English (US)",

volume = "5225",

pages = "40--48",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

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note = "Nano- and Micro-Optics for Information Systems ; Conference date: 03-08-2003 Through 04-08-2003",

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T1 - Stiction Problems in Releasing of 3D Microstructures and Its Solution

AU - Wu, Dongmin

AU - Fang, Nicholas

AU - Sun, Cheng

AU - Zhang, Xiang

PY - 2003

Y1 - 2003

N2 - Micro-stereolithography (μSL) is capable of fabrication of highly complex three-dimensional (3D) microstructures by selectively photo-induced polymerization from the monomer resin. However, during the evaporative drying of structures from liquid resin, the 3D microstructures often collapse due to the capillary force. In this work, a theoretical model is developed to analyze the deflection and adhesion between thin polymer beams under capillary force. The detachment length of the test structures and adhesion energy of a typical μSL polymer (HDDA) are obtained experimentally which are important for MEMS structure design. Finally, we successfully developed a sublimation process to release the 3D microstructures without the adhesion.

AB - Micro-stereolithography (μSL) is capable of fabrication of highly complex three-dimensional (3D) microstructures by selectively photo-induced polymerization from the monomer resin. However, during the evaporative drying of structures from liquid resin, the 3D microstructures often collapse due to the capillary force. In this work, a theoretical model is developed to analyze the deflection and adhesion between thin polymer beams under capillary force. The detachment length of the test structures and adhesion energy of a typical μSL polymer (HDDA) are obtained experimentally which are important for MEMS structure design. Finally, we successfully developed a sublimation process to release the 3D microstructures without the adhesion.

KW - MEMS

KW - Micro stereolithography

KW - Photo polymerization

KW - Polymer

KW - Surface tension

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DO - 10.1117/12.506644

M3 - Conference article

AN - SCOPUS:1242263782

SN - 0277-786X

VL - 5225

SP - 40

EP - 48

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Nano- and Micro-Optics for Information Systems

Y2 - 3 August 2003 through 4 August 2003

ER -

Stiction Problems in Releasing of 3D Microstructures and Its Solution

Abstract

Keywords

ASJC Scopus subject areas

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