Structural characterization and magnetization reversal of 0.1 μm scale antidot-type arrays patterned by Ga+ irradiation

N. W. Owen, A. K. Petford-Long

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this article, we present conventional transmission electron microscopy (TEM), Lorentz TEM and micromagnetic simulation, the relation between the structural changes accompanying the irradiation process and the magnetisation reversal of magnetic films patterned with arrays of 0.1 μm scale square antidots. The arrays have been fabricated in Co thin film as well as NiFe thin film using a focused ion beam system.

Original languageEnglish (US)
Title of host publicationIntermag 2003 - Program of the 2003 IEEE International Magnetics Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780376471, 9780780376472
DOIs
StatePublished - Jan 1 2003
Event2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, United States
Duration: Mar 30 2003Apr 3 2003

Publication series

NameIntermag 2003 - Program of the 2003 IEEE International Magnetics Conference

Other

Other2003 IEEE International Magnetics Conference, Intermag 2003
Country/TerritoryUnited States
CityBoston
Period3/30/034/3/03

Keywords

  • Atomic layer deposition
  • Electron microscopy
  • Gas insulated transmission lines
  • Magnetic films
  • Magnetic force microscopy
  • Magnetic materials
  • Magnetic properties
  • Magnetization reversal
  • Sputtering
  • Transmission electron microscopy

ASJC Scopus subject areas

  • General Engineering

Fingerprint

Dive into the research topics of 'Structural characterization and magnetization reversal of 0.1 μm scale antidot-type arrays patterned by Ga+ irradiation'. Together they form a unique fingerprint.

Cite this