Structural characterization and magnetization reversal of 0.1 μm Scale antidot-type arrays patterned by Ga+ irradiation

N. W. Owen*, A. K. Petford-Long

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

The structural characterization and magnetization reversal of 0.1 μm scale antidot-type arrays patterned by Ga ions irradiation were discussed. The arrays were fabricated in Co thin films and NiFe thin films using a focused ion beam. From the absence of cracks it was proved that recrystallization of the films had occurred under FIB irradiation.

Original languageEnglish (US)
JournalDigests of the Intermag Conference
StatePublished - Oct 1 2003
EventIntermag 2003: International Magnetics Conference - Boston, MA, United States
Duration: Mar 28 2003Apr 3 2003

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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