INIS
lasers
100%
thin films
100%
deposition
100%
zirconium
100%
yttrium oxides
100%
oxygen
42%
films
28%
substrates
28%
sapphire
28%
scanning electron microscopy
14%
transmission electron microscopy
14%
electron scanning
14%
resolution
14%
growth
14%
x-ray diffraction
14%
crystals
14%
orientation
14%
experimental data
14%
epitaxy
14%
nucleation
14%
Chemistry
Pulsed Laser Deposition
100%
Liquid Film
100%
Zirconia
100%
Yttrium Oxide
100%
Dioxygen
42%
Pressure
42%
Sapphire
28%
Procedure
28%
Scanning Electron Microscopy
14%
Crystal Orientation
14%
Nucleation
14%
High-Resolution Transmission Electron Microscopy
14%
Material Science
Thin Films
100%
Yttria Stabilized Zirconia
100%
Structural Property
100%
Pulsed Laser Deposition
100%
Scanning Electron Microscopy
14%
Crystal Orientation
14%