Structure and magnetic properties of Co/Cu multilayer films

J. D. Kim*, A. K. Petford-Long, J. P. Jakubovics, J. E. Evetts, R. Somekh

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

The structure, magnetic properties and magnetoresistance of Co/Cu multilayer films grown by sputtering on Si (100) wafers, with Co layer thicknesses between 1.9 nm and 2.0 nm and Cu layer thicknesses between 0.5 nm and 1.3 nm, have been studied. X-ray diffraction, transmission electron microscopy, and optical diffractogram analysis show layered structures and a columnar face-centred-cubic (111) crystallographic texture extending through several layers in the films. The magnetic domain structure was studied by Lorentz microscopy, and the domain structure and image contrast were found to depend strongly on the Cu layer thickness and magnetoresistance. Hysteresis curves explain the trends of magnetic domain contrast and magnetic coupling in the films. Annealed samples show a more regular domain structure, and lower saturating field and magnetoresistance than as-sputtered samples.

Original languageEnglish (US)
Pages (from-to)2387-2394
Number of pages8
JournalJournal of Applied Physics
Volume76
Issue number4
DOIs
StatePublished - Dec 1 1994

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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