Structure and magnetic properties of Co/Cu multilayer films

J. D. Kim; A. K. Petford-Long; J. P. Jakubovics; J. E. Evetts; R. Somekh

doi:10.1063/1.357586

Structure and magnetic properties of Co/Cu multilayer films

J. D. Kim^*, A. K. Petford-Long, J. P. Jakubovics, J. E. Evetts, R. Somekh

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Abstract

The structure, magnetic properties and magnetoresistance of Co/Cu multilayer films grown by sputtering on Si (100) wafers, with Co layer thicknesses between 1.9 nm and 2.0 nm and Cu layer thicknesses between 0.5 nm and 1.3 nm, have been studied. X-ray diffraction, transmission electron microscopy, and optical diffractogram analysis show layered structures and a columnar face-centred-cubic (111) crystallographic texture extending through several layers in the films. The magnetic domain structure was studied by Lorentz microscopy, and the domain structure and image contrast were found to depend strongly on the Cu layer thickness and magnetoresistance. Hysteresis curves explain the trends of magnetic domain contrast and magnetic coupling in the films. Annealed samples show a more regular domain structure, and lower saturating field and magnetoresistance than as-sputtered samples.

Original language	English (US)
Pages (from-to)	2387-2394
Number of pages	8
Journal	Journal of Applied Physics
Volume	76
Issue number	4
DOIs	https://doi.org/10.1063/1.357586
State	Published - Dec 1 1994

ASJC Scopus subject areas

Physics and Astronomy(all)

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title = "Structure and magnetic properties of Co/Cu multilayer films",

abstract = "The structure, magnetic properties and magnetoresistance of Co/Cu multilayer films grown by sputtering on Si (100) wafers, with Co layer thicknesses between 1.9 nm and 2.0 nm and Cu layer thicknesses between 0.5 nm and 1.3 nm, have been studied. X-ray diffraction, transmission electron microscopy, and optical diffractogram analysis show layered structures and a columnar face-centred-cubic (111) crystallographic texture extending through several layers in the films. The magnetic domain structure was studied by Lorentz microscopy, and the domain structure and image contrast were found to depend strongly on the Cu layer thickness and magnetoresistance. Hysteresis curves explain the trends of magnetic domain contrast and magnetic coupling in the films. Annealed samples show a more regular domain structure, and lower saturating field and magnetoresistance than as-sputtered samples.",

author = "Kim, {J. D.} and Petford-Long, {A. K.} and Jakubovics, {J. P.} and Evetts, {J. E.} and R. Somekh",

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AU - Kim, J. D.

AU - Petford-Long, A. K.

AU - Jakubovics, J. P.

AU - Evetts, J. E.

AU - Somekh, R.

PY - 1994/12/1

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AB - The structure, magnetic properties and magnetoresistance of Co/Cu multilayer films grown by sputtering on Si (100) wafers, with Co layer thicknesses between 1.9 nm and 2.0 nm and Cu layer thicknesses between 0.5 nm and 1.3 nm, have been studied. X-ray diffraction, transmission electron microscopy, and optical diffractogram analysis show layered structures and a columnar face-centred-cubic (111) crystallographic texture extending through several layers in the films. The magnetic domain structure was studied by Lorentz microscopy, and the domain structure and image contrast were found to depend strongly on the Cu layer thickness and magnetoresistance. Hysteresis curves explain the trends of magnetic domain contrast and magnetic coupling in the films. Annealed samples show a more regular domain structure, and lower saturating field and magnetoresistance than as-sputtered samples.

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