The structure, magnetic properties and magnetoresistance of Co/Cu multilayer films grown by sputtering on Si (100) wafers, with Co layer thicknesses between 1.9 nm and 2.0 nm and Cu layer thicknesses between 0.5 nm and 1.3 nm, have been studied. X-ray diffraction, transmission electron microscopy, and optical diffractogram analysis show layered structures and a columnar face-centred-cubic (111) crystallographic texture extending through several layers in the films. The magnetic domain structure was studied by Lorentz microscopy, and the domain structure and image contrast were found to depend strongly on the Cu layer thickness and magnetoresistance. Hysteresis curves explain the trends of magnetic domain contrast and magnetic coupling in the films. Annealed samples show a more regular domain structure, and lower saturating field and magnetoresistance than as-sputtered samples.
ASJC Scopus subject areas
- Physics and Astronomy(all)