Structure and physical properties of polycrystalline hexagonal Ta₂N films deposited by reactive sputtering

INIS

• films 100%
• sputtering 33%
• deposition 33%
• substrates 33%
• glass 33%
• polycrystals 33%
• transmission electron microscopy 16%
• thin films 16%
• temperature range 0273-0400 k 16%
• physical properties 16%
• grain size 16%
• temperature coefficient 16%
• heaters 16%
• preferred orientation 16%

Chemistry

• Liquid Film 100%
• Grain Size 33%
• Structure 33%
• Resistivity 33%
• Glass Substrate 16%
• Reactive Sputtering 16%
• Ambient Reaction Temperature 16%
• Atom 16%
• Sputter Deposition 16%
• Physical Property 16%
• Glass 16%
• Reaction Temperature 16%

Material Science

• Liquid Films 100%
• Transmission Electron Microscopy 33%
• Thin Films 16%
• Glass 16%