Study of growth and oxidation of vanadium films on α-Fe2O3(0001)

Chang Yong Kim; Michael J. Bedzyk

doi:10.1016/j.tsf.2006.04.015

Study of growth and oxidation of vanadium films on α-Fe₂O₃(0001)

Chang Yong Kim^*, Michael J. Bedzyk

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

Electronic structures of the vanadium/vanadium-oxide films supported on α-Fe₂O₃(0001) were studied by using X-ray photoemission spectroscopy. The vanadium films were grown by evaporation of metallic vanadium at room temperature. The as-deposited V had a 3+ oxidation state and the α-Fe₂O₃(0001) surface was reduced at the initial coverage. After complete reduction of interface iron atoms, metallic V started to grow at a vanadium coverage greater than 2/3 monolayer. The V₂O₅ film was prepared by exposing the pre-deposited vanadium film to the atomic oxygen at room temperature. Converting to the V₂O₅ film was accompanied by re-oxidation of the α-Fe₂O₃ at the interface. The reduction and re-oxidation of interfacial iron manifest electron transfer between the adsorbed vanadium and substrate.

Original language	English (US)
Pages (from-to)	2015-2020
Number of pages	6
Journal	Thin Solid Films
Volume	515
Issue number	4
DOIs	https://doi.org/10.1016/j.tsf.2006.04.015
State	Published - Dec 5 2006

Keywords

Iron oxide
Oxidation
Vanadium oxide
X-ray photoelectron spectroscopy (XPS)

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2006.04.015

Cite this

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title = "Study of growth and oxidation of vanadium films on α-Fe2O3(0001)",

abstract = "Electronic structures of the vanadium/vanadium-oxide films supported on α-Fe2O3(0001) were studied by using X-ray photoemission spectroscopy. The vanadium films were grown by evaporation of metallic vanadium at room temperature. The as-deposited V had a 3+ oxidation state and the α-Fe2O3(0001) surface was reduced at the initial coverage. After complete reduction of interface iron atoms, metallic V started to grow at a vanadium coverage greater than 2/3 monolayer. The V2O5 film was prepared by exposing the pre-deposited vanadium film to the atomic oxygen at room temperature. Converting to the V2O5 film was accompanied by re-oxidation of the α-Fe2O3 at the interface. The reduction and re-oxidation of interfacial iron manifest electron transfer between the adsorbed vanadium and substrate.",

keywords = "Iron oxide, Oxidation, Vanadium oxide, X-ray photoelectron spectroscopy (XPS)",

author = "Kim, {Chang Yong} and Bedzyk, {Michael J.}",

note = "Funding Information: This research is supported by the Chemical Sciences, Geosciences and Biosciences Division, Office of Basic Energy Sciences, Office of Science, U.S. Department of Energy, Grant No. DE-FG02-03ER15457. The work made use of Northwestern University Central Facilities supported by the MRSEC program of the NSF (DMR-0520513).",

year = "2006",

month = dec,

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doi = "10.1016/j.tsf.2006.04.015",

language = "English (US)",

volume = "515",

pages = "2015--2020",

journal = "Thin Solid Films",

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T1 - Study of growth and oxidation of vanadium films on α-Fe2O3(0001)

AU - Kim, Chang Yong

AU - Bedzyk, Michael J.

N1 - Funding Information: This research is supported by the Chemical Sciences, Geosciences and Biosciences Division, Office of Basic Energy Sciences, Office of Science, U.S. Department of Energy, Grant No. DE-FG02-03ER15457. The work made use of Northwestern University Central Facilities supported by the MRSEC program of the NSF (DMR-0520513).

PY - 2006/12/5

Y1 - 2006/12/5

N2 - Electronic structures of the vanadium/vanadium-oxide films supported on α-Fe2O3(0001) were studied by using X-ray photoemission spectroscopy. The vanadium films were grown by evaporation of metallic vanadium at room temperature. The as-deposited V had a 3+ oxidation state and the α-Fe2O3(0001) surface was reduced at the initial coverage. After complete reduction of interface iron atoms, metallic V started to grow at a vanadium coverage greater than 2/3 monolayer. The V2O5 film was prepared by exposing the pre-deposited vanadium film to the atomic oxygen at room temperature. Converting to the V2O5 film was accompanied by re-oxidation of the α-Fe2O3 at the interface. The reduction and re-oxidation of interfacial iron manifest electron transfer between the adsorbed vanadium and substrate.

AB - Electronic structures of the vanadium/vanadium-oxide films supported on α-Fe2O3(0001) were studied by using X-ray photoemission spectroscopy. The vanadium films were grown by evaporation of metallic vanadium at room temperature. The as-deposited V had a 3+ oxidation state and the α-Fe2O3(0001) surface was reduced at the initial coverage. After complete reduction of interface iron atoms, metallic V started to grow at a vanadium coverage greater than 2/3 monolayer. The V2O5 film was prepared by exposing the pre-deposited vanadium film to the atomic oxygen at room temperature. Converting to the V2O5 film was accompanied by re-oxidation of the α-Fe2O3 at the interface. The reduction and re-oxidation of interfacial iron manifest electron transfer between the adsorbed vanadium and substrate.

KW - Iron oxide

KW - Oxidation

KW - Vanadium oxide

KW - X-ray photoelectron spectroscopy (XPS)

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JF - Thin Solid Films

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