Study of growth and oxidation of vanadium films on α-Fe2O3(0001)

Chang Yong Kim*, Michael J. Bedzyk

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

Electronic structures of the vanadium/vanadium-oxide films supported on α-Fe2O3(0001) were studied by using X-ray photoemission spectroscopy. The vanadium films were grown by evaporation of metallic vanadium at room temperature. The as-deposited V had a 3+ oxidation state and the α-Fe2O3(0001) surface was reduced at the initial coverage. After complete reduction of interface iron atoms, metallic V started to grow at a vanadium coverage greater than 2/3 monolayer. The V2O5 film was prepared by exposing the pre-deposited vanadium film to the atomic oxygen at room temperature. Converting to the V2O5 film was accompanied by re-oxidation of the α-Fe2O3 at the interface. The reduction and re-oxidation of interfacial iron manifest electron transfer between the adsorbed vanadium and substrate.

Original languageEnglish (US)
Pages (from-to)2015-2020
Number of pages6
JournalThin Solid Films
Volume515
Issue number4
DOIs
StatePublished - Dec 5 2006

Keywords

  • Iron oxide
  • Oxidation
  • Vanadium oxide
  • X-ray photoelectron spectroscopy (XPS)

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Study of growth and oxidation of vanadium films on α-Fe<sub>2</sub>O<sub>3</sub>(0001)'. Together they form a unique fingerprint.

Cite this