Abstract
Electronic structures of the vanadium/vanadium-oxide films supported on α-Fe2O3(0001) were studied by using X-ray photoemission spectroscopy. The vanadium films were grown by evaporation of metallic vanadium at room temperature. The as-deposited V had a 3+ oxidation state and the α-Fe2O3(0001) surface was reduced at the initial coverage. After complete reduction of interface iron atoms, metallic V started to grow at a vanadium coverage greater than 2/3 monolayer. The V2O5 film was prepared by exposing the pre-deposited vanadium film to the atomic oxygen at room temperature. Converting to the V2O5 film was accompanied by re-oxidation of the α-Fe2O3 at the interface. The reduction and re-oxidation of interfacial iron manifest electron transfer between the adsorbed vanadium and substrate.
Original language | English (US) |
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Pages (from-to) | 2015-2020 |
Number of pages | 6 |
Journal | Thin Solid Films |
Volume | 515 |
Issue number | 4 |
DOIs | |
State | Published - Dec 5 2006 |
Keywords
- Iron oxide
- Oxidation
- Vanadium oxide
- X-ray photoelectron spectroscopy (XPS)
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry