@inproceedings{964a7d4cc026422e85033137115849b4,
title = "STUDY OF THE IMPURITY REDISTRIBUTION IN InP METALORGANIC CHEMICAL VAPOR DEPOSITED EPILAYERS.",
abstract = "This paper reports new experimental results using secondary ion mass spectrometry analysis for quantitative determination of impurities in MOCVD InP layers. Mg, Mn, Fe, Cr and Si accumulation at the substrate-epilayer interface was observed. The origin of these elements was determined. The major source of impurities was the adsorption of atoms on the substrate surface during chemical etching prior to epitaxy.",
author = "Huber, {A. M.} and M. Razeghi and G. Morillot",
year = "1985",
month = dec,
day = "1",
language = "English (US)",
isbn = "0854981659",
series = "Institute of Physics Conference Series",
number = "74",
pages = "223--228",
editor = "{de Cremoux}, B.",
booktitle = "Institute of Physics Conference Series",
edition = "74",
}