Studying density vs. Ar-pressures for optimization of DC-magnetron sputter deposition of Ni/C multilayers for hard X-ray telescopes

A. M. Hussain*, S. Romaine, P. Gorenstein, J. Everett, R. Bruni, A. Clark, M. Ruane, Y. Fedyunin

*Corresponding author for this work

Research output: Contribution to journalConference article

Abstract

The influence of varying the Ar-pressure in the process of depositing Ni/C multilayers by DC-magnetron sputtering has been studied, and Atomic Force Microscopy (AFM) measurements, X-ray characterization results and Transmission Electron Microscopy (TEM) results are presented. Single Ni and C films and Ni/C multilayers were deposited at Ar-pressures of 1.5, 3, 5 and 7 mTorr. The one-dimensional power spectral density data from the AFM measurements clearly indicate that the best densities and film qualities for both materials are obtained at lower Ar-pressures, i.e. 1.5 mTorr.

Original languageEnglish (US)
Pages (from-to)260-266
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3113
DOIs
StatePublished - Dec 1 1997
EventGrazing Incidence and Multilayer X-Ray Optical Systems - San Diego, CA, United States
Duration: Jul 27 1997Jul 29 1997

Keywords

  • AFM-measurements
  • Ar-pressure
  • DC-magnetron sputtering
  • Density
  • Multilayers
  • TEM-measurements
  • X-ray Telescopes
  • X-ray reflection measurements

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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