@inproceedings{ce78d3d241a047e59bf8ac0ec119c2f3,
title = "Sub-10nm nanolithography and direct pattern transfer on III-V compound semiconductor using sol-gel derived ZrO2",
abstract = "A new approach for direct sub-10nm pattern transfer using spin-coated ZrO2 is presented. The sample InP compound etching selectivity to ZrO2 is over 13:1 with highest aspect ratio of 35:1. The smallest feature is 9nm.",
author = "Boyang Liu and Ho, {Seng Tiong}",
year = "2008",
language = "English (US)",
isbn = "9781557528599",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of America",
booktitle = "Conference on Lasers and Electro-Optics, CLEO 2008",
note = "Conference on Lasers and Electro-Optics, CLEO 2008 ; Conference date: 04-05-2008 Through 09-05-2008",
}