Subnanometer scale study of segregation at grain boundaries in an Fe(Si) alloy

B. W. Krakauer, D. N. Seidman*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

73 Scopus citations

Abstract

The Gibbsian interfacial excess of silicon (ΓSi) was determined, on an atomic scale, for 14 grain boundaries (GBs) in a single-phase Fe-3 at.% Si alloy, using a unique combined atom-probe field-ion microscopy/transmission electron microscopy (APFIM/TEM) approach. The specimens were equilibrated at 823 K for 14.5 or 72.5 h before the analyses. TEM was first employed to determine the five geometric degrees of freedom (DOFs) of each GB: unit rotation axis, θ, rotation angle, θ, and unit GB plane normal, n. APFIM analyses were then utilized to obtain integral profiles perpendicular to the GB planes and from these profiles ΓSi was determined for each GB. The values of ΓSi are displayed in three dimensions as a function of sin(θdis/2) and cos(∠c,n); θdis is the disorientation angle. This three-dimensional plot represents ΓSi as a function of the five macroscopic DOFs and is a direct representation of GB phase space segregation data.

Original languageEnglish (US)
Pages (from-to)6145-6161
Number of pages17
JournalActa Materialia
Volume46
Issue number17
DOIs
StatePublished - Nov 1998

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Polymers and Plastics
  • Metals and Alloys

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