Summary Abstract: Plasma-enhanced beam deposition of thin dielectric films

R. P H Chang; S. Darack

doi:10.1116/1.571986

Summary Abstract: Plasma-enhanced beam deposition of thin dielectric films

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	717-718
Number of pages	2
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	1
Issue number	2
DOIs	https://doi.org/10.1116/1.571986
State	Published - Jan 1 1983

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.571986

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title = "Summary Abstract: Plasma-enhanced beam deposition of thin dielectric films",

author = "Chang, {R. P H} and S. Darack",

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JF - Journal of Vacuum Science and Technology A

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Summary Abstract: Plasma-enhanced beam deposition of thin dielectric films

ASJC Scopus subject areas

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