Summary Abstract: The role of low-energy ion bombardment during the growth of epitaxial TiN(100) films by reactive magnetron sputtering: Defect formation and annihilation

L. Hultman, U. Helmersson, S. A. Barnett

Research output: Contribution to journalArticlepeer-review

5 Scopus citations
Original languageEnglish (US)
Pages (from-to)2162-2164
Number of pages3
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number4
StatePublished - Jul 1 1987

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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