Superconducting tunnel junction base electrode planarization

C. D. Thomas; M. P. Ulmer; J. B. Ketterson

doi:10.1063/1.368037

Superconducting tunnel junction base electrode planarization

C. D. Thomas^*, M. P. Ulmer, J. B. Ketterson

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

We have investigated the planarizing effects of multilayered superconducting thin films. Atomic force microscopy measurements indicate that coating a standard niobium base electrode with alternating layers of aluminum and niobium significantly reduces the film's overall surface roughness. Planarized films such as these were used as the base electrodes of superconducting tunnel junctions that show vastly improved leakage characteristics over conventional junctions fabricated under the same conditions.

Original language	English (US)
Pages (from-to)	364-367
Number of pages	4
Journal	Journal of Applied Physics
Volume	84
Issue number	1
DOIs	https://doi.org/10.1063/1.368037
State	Published - Jul 1 1998

ASJC Scopus subject areas

Physics and Astronomy(all)

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title = "Superconducting tunnel junction base electrode planarization",

abstract = "We have investigated the planarizing effects of multilayered superconducting thin films. Atomic force microscopy measurements indicate that coating a standard niobium base electrode with alternating layers of aluminum and niobium significantly reduces the film's overall surface roughness. Planarized films such as these were used as the base electrodes of superconducting tunnel junctions that show vastly improved leakage characteristics over conventional junctions fabricated under the same conditions.",

author = "Thomas, {C. D.} and Ulmer, {M. P.} and Ketterson, {J. B.}",

year = "1998",

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AU - Thomas, C. D.

AU - Ulmer, M. P.

AU - Ketterson, J. B.

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N2 - We have investigated the planarizing effects of multilayered superconducting thin films. Atomic force microscopy measurements indicate that coating a standard niobium base electrode with alternating layers of aluminum and niobium significantly reduces the film's overall surface roughness. Planarized films such as these were used as the base electrodes of superconducting tunnel junctions that show vastly improved leakage characteristics over conventional junctions fabricated under the same conditions.

AB - We have investigated the planarizing effects of multilayered superconducting thin films. Atomic force microscopy measurements indicate that coating a standard niobium base electrode with alternating layers of aluminum and niobium significantly reduces the film's overall surface roughness. Planarized films such as these were used as the base electrodes of superconducting tunnel junctions that show vastly improved leakage characteristics over conventional junctions fabricated under the same conditions.

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DO - 10.1063/1.368037

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Superconducting tunnel junction base electrode planarization

Abstract

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