Abstract
Nanocomposite films of polycrystalline nitride superlattices with nanometer grain size were deposited onto tool steel substrates by a one-step process using an opposed-cathode high-rate reactive unbalanced magnetron sputtering system. The superlattices are composed of alternating thin layers of different nitrides such as TiN/NbN and TiN/VN. The thicknesses of two neighboring layers were between 3 and 150 nm and were determined by the rotating speed of the substrate holder and the sputtering rate of the individual layer material. The films exhibited exceptional hardness as high as 5200 kgf/mm2 for TiN/NbN superlattice and 5100 kgf/mm2 for TiN/VN superlattice. The hardnesses of the superlattice coatings were strongly dependent on several deposition parameters such as the superlattice period, the nitrogen partial pressure, and the substrate bias voltage. One of the possible mechanisms for the hardness enhancement is the effect of nanophase materials, which were created mainly by the influence of the artificially layered-structure and the low energy ion bombardment during film growth.
| Original language | English (US) |
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| Title of host publication | Materials Research Society Symposium Proceedings |
| Publisher | Publ by Materials Research Society |
| Pages | 379-384 |
| Number of pages | 6 |
| Volume | 286 |
| ISBN (Print) | 1558991816 |
| State | Published - Jan 1 1993 |
| Event | Proceedings of the 3rd Biennial Meeting of Chemical Perspectives of Microelectronic Materials - Boston, MA, USA Duration: Nov 30 1992 → Dec 3 1992 |
Other
| Other | Proceedings of the 3rd Biennial Meeting of Chemical Perspectives of Microelectronic Materials |
|---|---|
| City | Boston, MA, USA |
| Period | 11/30/92 → 12/3/92 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials