Superhard nanocomposite of nitride superlattices by opposed-cathode unbalanced magnetron sputtering

X. Chu*, M. S. Wong, W. D. Sproul, Scott A Barnett

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Scopus citations

Abstract

Nanocomposite films of polycrystalline nitride superlattices with nanometer grain size were deposited onto tool steel substrates by a one-step process using an opposed-cathode high-rate reactive unbalanced magnetron sputtering system. The superlattices are composed of alternating thin layers of different nitrides such as TiN/NbN and TiN/VN. The thicknesses of two neighboring layers were between 3 and 150 nm and were determined by the rotating speed of the substrate holder and the sputtering rate of the individual layer material. The films exhibited exceptional hardness as high as 5200 kgf/mm2 for TiN/NbN superlattice and 5100 kgf/mm2 for TiN/VN superlattice. The hardnesses of the superlattice coatings were strongly dependent on several deposition parameters such as the superlattice period, the nitrogen partial pressure, and the substrate bias voltage. One of the possible mechanisms for the hardness enhancement is the effect of nanophase materials, which were created mainly by the influence of the artificially layered-structure and the low energy ion bombardment during film growth.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
PublisherPubl by Materials Research Society
Pages379-384
Number of pages6
Volume286
ISBN (Print)1558991816
StatePublished - Jan 1 1993
EventProceedings of the 3rd Biennial Meeting of Chemical Perspectives of Microelectronic Materials - Boston, MA, USA
Duration: Nov 30 1992Dec 3 1992

Other

OtherProceedings of the 3rd Biennial Meeting of Chemical Perspectives of Microelectronic Materials
CityBoston, MA, USA
Period11/30/9212/3/92

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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