Surface diffusivity of atomic deuterium on Ni3(Al, Ti)(110) surface with and without boron

J. L. Wang*, Yip-Wah Chung

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The electron-stimulated desorption was used to measure the surface diffusivity of atomic deuterium on clean and boron-modified Ni3(Al, Ti)(110) surfaces. Boron dosing was performed by using a solid-state boron ion source. Earlier studies show that boron dissociates water readily at temperature as low as 130 K and the resulting atomic hydrogen is bound to the surface strongly. The surface diffusion coefficient of atomic deuterium on 0.05 monolayer boron-modified surface was measured to be about 10 times smaller than that on the clean surface. This slower diffusion of atomic hydrogen may explain why boron improves the ductility of polycrystalline Ni3Al in moist environment.

Original languageEnglish (US)
Pages (from-to)649-652
Number of pages4
JournalTransactions of Nonferrous Metals Society of China (English Edition)
Volume12
Issue number4
StatePublished - Aug 1 2002

Keywords

  • Deuterium
  • Hydrogen
  • NiAl
  • Surface diffusion

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Geotechnical Engineering and Engineering Geology
  • Metals and Alloys
  • Materials Chemistry

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