TY - JOUR
T1 - Surface recombination at semiconductor electrodes: A single level study
AU - Ramakrishna, S.
AU - Rangarajan, S.K.
AU - Sesha Shankar, Ramakrishna
PY - 1991
Y1 - 1991
N2 - The recombination and the faradaic fluxes are shown to be sensitive to the location of a single level recombination center, when it is located near the band edges. As the surface level is shifted deeper into the band gap from either of the band edges, the back emission terms are dominated by electron capture and hole capture terms, and the occupancy of the surface level is no longer determined by its location in the band gap. However, when one of the back emission terms determines the surface state occupancy, it is shown that there exists a simple relation between the value of the surface level and the recombination and the faradaic fluxes respectively. Expressions to this effect are derived and verified in the case of the recombination flux, which characterized by the potential at which it attains its maximum value. For the faradaic flux the results are qualitative.
AB - The recombination and the faradaic fluxes are shown to be sensitive to the location of a single level recombination center, when it is located near the band edges. As the surface level is shifted deeper into the band gap from either of the band edges, the back emission terms are dominated by electron capture and hole capture terms, and the occupancy of the surface level is no longer determined by its location in the band gap. However, when one of the back emission terms determines the surface state occupancy, it is shown that there exists a simple relation between the value of the surface level and the recombination and the faradaic fluxes respectively. Expressions to this effect are derived and verified in the case of the recombination flux, which characterized by the potential at which it attains its maximum value. For the faradaic flux the results are qualitative.
U2 - 10.1016/0022-0728(91)85058-W
DO - 10.1016/0022-0728(91)85058-W
M3 - Article
VL - 308
SP - 49
JO - J. Electroanal. Chem.
JF - J. Electroanal. Chem.
ER -