Synthesis and characterization of single and multilayer boron nitride and boron carbide thin films grown by magnetron sputtering of boron carbide

M. U. Guruz, V. P. Dravid, Y. W. Chung*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

Single and multilayer boron nitride and boron carbide films were grown using d.c. magnetron sputtering in a single cathode deposition system. High frequency pulsed bias voltages were applied to both the target and the substrate during deposition. An external solenoid was utilized to increase the ion flux during deposition. Momentum of incident ions was found to play a key role for cubic BN:C formation. Multilayer film growth was investigated as a way to obtain thick and adherent cubic boron nitride containing coatings. Boron carbide films were found to have a hardness exceeding 40 GPa and a smooth surface morphology (r.m.s. roughness 0.1-0.15 nm), high elasticity, and high wear resistance.

Original languageEnglish (US)
Pages (from-to)129-135
Number of pages7
JournalThin Solid Films
Volume414
Issue number1
DOIs
StatePublished - Jul 1 2002

Keywords

  • Boron carbide
  • Cubic boron nitride
  • Multilayer films
  • Pulsed bias

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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