Ultrathin films of carbon nitride were grown using dc magnetron sputtering. A pulsed bias was applied to both the target and the substrate during deposition to help sustain a stable plasma and enhance ion bombardment of the growing film. These films exhibit excellent corrosion resistance at film thickness around 2 nm. Atomic force microscopy measurements reveal an atomically smooth surface. The role of pulsed bias and bombardment by ionized species in obtaining low defect-density coatings is discussed.
|Original language||English (US)|
|Number of pages||5|
|Journal||American Society of Mechanical Engineers, Tribology Division, TRIB|
|State||Published - Dec 1 1999|
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