Multilayer carbon nitride/TiN coatings were synthesized using a dual-cathode dc magnetron sputtering system. Fully crystalline films can be obtained when the thickness of the carbon nitride component is on the order of one nm. There appears to be a strong correlation between the occurrence of strong TiN(111) texture and the hardness of these multilayer coatings, as controlled by target powers, nitrogen partial pressure and substrate bias. These coatings can be synthesized at near room temperatures, with smooth surface morphology and hardness in the range of 45-55 GPa.
|Original language||English (US)|
|Number of pages||7|
|Journal||Materials Research Society Symposium - Proceedings|
|State||Published - Dec 1 1996|
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials