Synthesis of hard TiN coatings with suppressed columnar growth and reduced stress

M. M. Lacerda*, Y. H. Chen, B. Zhou, M. U. Guruz, Yip-Wah Chung

*Corresponding author for this work

Research output: Contribution to journalArticle

26 Scopus citations

Abstract

Titanium nitride normally grows with a columnar grain structure. In this study, we prepared TiN/CNx multilayered coatings with the intent of using the CNx layers to interrupt the grain growth of TiN to attain an equiaxed grain structure. The TiN/CNx coatings were synthesized by direct current magnetron sputtering. Our investigations showed that three important process conditions are required to obtain superhard and smooth TiN/CNx coatings with low internal stress: (i) a TiN buffer layer with strong (111) texture; (ii) proper bias during the growth of the TiN buffer and TiN/CNx coating; and (iii) small thickness for the CNx layers.

Original languageEnglish (US)
Pages (from-to)2915-2919
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume17
Issue number5
DOIs
StatePublished - Jan 1 1999

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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