Synthesis of supported catalysts by atomic layer deposition

Peter C. Stair

doi:10.1007/s11244-012-9776-4

Synthesis of supported catalysts by atomic layer deposition

Peter C. Stair^*

^*Corresponding author for this work

Chemistry

Research output: Contribution to journal › Article › peer-review

35 Scopus citations

Abstract

A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.

Original language	English (US)
Pages (from-to)	93-98
Number of pages	6
Journal	Topics in Catalysis
Volume	55
Issue number	1-2
DOIs	https://doi.org/10.1007/s11244-012-9776-4
State	Published - Mar 2012

Funding

Acknowledgments The work at Argonne National Laboratory was supported by the U.S. Department of Energy, BES-HFI, Chemical Sciences under Contract DE-AC-02-06CH11357. The work at Northwestern University was financially supported by The Dow Chemical Company under the Dow Methane Challenge Award.

Keywords

Atomic layer epitaxy
High surface area catalytic materials
Oxide and metal atomic layers

ASJC Scopus subject areas

Catalysis
General Chemistry

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10.1007/s11244-012-9776-4

Cite this

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abstract = "A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.",

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AB - A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.

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Synthesis of supported catalysts by atomic layer deposition

Abstract

Funding

Keywords

ASJC Scopus subject areas

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