Synthesis of supported catalysts by atomic layer deposition

Peter C. Stair*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

32 Scopus citations


A promising new method of catalyst synthesis is atomic layer deposition (ALD). ALD is a variation on chemical vapor deposition wherein metals, oxides and other materials are deposited on surfaces via a sequence (usually binary) of self-limiting reactions. The self-limiting character of the reactions makes it possible to achieve uniform deposits on high-surface-area porous solids and, hence, produce practical catalytic materials. The ability to deposit uniform layers in a sequence makes it possible to fabricate the support and then construct the catalytic metal and/or metal oxide species and add modifier layers in any desired order. This article will provide a short introduction to the technique of ALD and its application to the synthesis of supported catalytic metal nanoparticles and oxide monolayers.

Original languageEnglish (US)
Pages (from-to)93-98
Number of pages6
JournalTopics in Catalysis
Issue number1-2
StatePublished - Mar 2012


  • Atomic layer epitaxy
  • High surface area catalytic materials
  • Oxide and metal atomic layers

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)


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