Systematic studies of fullerene derivative electron beam resists

A. P G Robinson*, R. E. Palmer, T. Tada, T. Kanayama, E. J. Shelley, D. Philp, J. A. Preece

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

1 Scopus citations

Abstract

We report systematic studies of the response of C60 derivatives to electron beam irradiation. Films of fourteen different mono, tris and tetra adduct methanofullerene C60 derivatives were produced by spin coating on hydrogen terminated silicon substrates. Exposure of the films to a 20 keV electron beam substantially altered the dissolution rate of the derivative films in organic solvents such as monochlorobenzene. All of the derivatives exhibited negative tone resist behaviour with sensitivities between approx. 8.5 × 10-4 and approx. 4 × 10-3 C/cm2, much higher than that of C60. Features with widths of approx. 20 nm were produced using these compounds, and the etch ratios of the compounds were found to be more than twice those of a standard novolac based resist (SAL601).

Original languageEnglish (US)
Pages (from-to)115-120
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume584
StatePublished - Jan 1 2000
EventMaterial Issues and Modeling for Device Nanofabrication - Boston, MA, USA
Duration: Nov 29 1999Dec 2 1999

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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