In this study, Ta/Ni81Fe19/Cu/Co/Mn50Fe50/Ta and Ta/Ni81Fe19/Co/Cu/Co/Mn50Fe50/Ta spin-valve (SV) films were annealed in-situ at temperatures in the range of 25°C up to 350°C. The reversal processes of these SV films were determined and compared.
|Original language||English (US)|
|Journal||Digests of the Intermag Conference|
|State||Published - Jan 1 1999|
|Event||Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea|
Duration: May 18 1999 → May 21 1999
ASJC Scopus subject areas
- Electrical and Electronic Engineering