Temperature dependence of the reversal mechanism in spin-valve films

X. Portier*, A. K. Petford-Long, T. C. Anthony, J. A. Brug

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review


In this study, Ta/Ni81Fe19/Cu/Co/Mn50Fe50/Ta and Ta/Ni81Fe19/Co/Cu/Co/Mn50Fe50/Ta spin-valve (SV) films were annealed in-situ at temperatures in the range of 25°C up to 350°C. The reversal processes of these SV films were determined and compared.

Original languageEnglish (US)
Pages (from-to)GE-02
JournalDigests of the Intermag Conference
StatePublished - 1999
EventProceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea
Duration: May 18 1999May 21 1999

ASJC Scopus subject areas

  • Electrical and Electronic Engineering


Dive into the research topics of 'Temperature dependence of the reversal mechanism in spin-valve films'. Together they form a unique fingerprint.

Cite this