Temperature dependence of the reversal mechanism in spin-valve films

X. Portier; A. K. Petford-Long; T. C. Anthony; J. A. Brug

doi:10.1109/intmag.1999.837873

Temperature dependence of the reversal mechanism in spin-valve films

X. Portier^*, A. K. Petford-Long, T. C. Anthony, J. A. Brug

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

In this study, Ta/Ni₈₁Fe₁₉/Cu/Co/Mn₅₀Fe₅₀/Ta and Ta/Ni₈₁Fe₁₉/Co/Cu/Co/Mn₅₀Fe₅₀/Ta spin-valve (SV) films were annealed in-situ at temperatures in the range of 25°C up to 350°C. The reversal processes of these SV films were determined and compared.

Original language	English (US)
Pages (from-to)	GE-02
Journal	Digests of the Intermag Conference
DOIs	https://doi.org/10.1109/intmag.1999.837873
State	Published - 1999
Event	Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' - Kyongju, South Korea Duration: May 18 1999 → May 21 1999

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1109/intmag.1999.837873

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@article{517294fed4c640248bc64bd8d2f5be75,

title = "Temperature dependence of the reversal mechanism in spin-valve films",

abstract = "In this study, Ta/Ni81Fe19/Cu/Co/Mn50Fe50/Ta and Ta/Ni81Fe19/Co/Cu/Co/Mn50Fe50/Ta spin-valve (SV) films were annealed in-situ at temperatures in the range of 25°C up to 350°C. The reversal processes of these SV films were determined and compared.",

author = "X. Portier and Petford-Long, {A. K.} and Anthony, {T. C.} and Brug, {J. A.}",

year = "1999",

doi = "10.1109/intmag.1999.837873",

language = "English (US)",

pages = "GE--02",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99' ; Conference date: 18-05-1999 Through 21-05-1999",

}

TY - JOUR

T1 - Temperature dependence of the reversal mechanism in spin-valve films

AU - Portier, X.

AU - Petford-Long, A. K.

AU - Anthony, T. C.

AU - Brug, J. A.

PY - 1999

Y1 - 1999

N2 - In this study, Ta/Ni81Fe19/Cu/Co/Mn50Fe50/Ta and Ta/Ni81Fe19/Co/Cu/Co/Mn50Fe50/Ta spin-valve (SV) films were annealed in-situ at temperatures in the range of 25°C up to 350°C. The reversal processes of these SV films were determined and compared.

AB - In this study, Ta/Ni81Fe19/Cu/Co/Mn50Fe50/Ta and Ta/Ni81Fe19/Co/Cu/Co/Mn50Fe50/Ta spin-valve (SV) films were annealed in-situ at temperatures in the range of 25°C up to 350°C. The reversal processes of these SV films were determined and compared.

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U2 - 10.1109/intmag.1999.837873

DO - 10.1109/intmag.1999.837873

M3 - Conference article

AN - SCOPUS:0033299334

SN - 0074-6843

SP - GE-02

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

T2 - Proceedings of the 1999 IEEE International Magnetics Conference 'Digest of Intermag 99'

Y2 - 18 May 1999 through 21 May 1999

ER -

Temperature dependence of the reversal mechanism in spin-valve films

Abstract

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