The application of three-dimensional atom probe analysis to GMR materials

A. K. Petford-Long; D. J. Larson; A. Cerezo

The application of three-dimensional atom probe analysis to GMR materials

A. K. Petford-Long^*, D. J. Larson, A. Cerezo

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

Three-dimensional atom probe analysis to giant magnetoresistance (GMR) materials was discussed. Interdiffison or interface segregation at the atomic level were studied. It was found that this technique is capable of characterizing internal interfaces with sub-nanometer-scale topological features.

Original language	English (US)
Journal	Digests of the Intermag Conference
State	Published - Oct 1 2003
Event	Intermag 2003: International Magnetics Conference - Boston, MA, United States Duration: Mar 28 2003 → Apr 3 2003

ASJC Scopus subject areas

Electrical and Electronic Engineering

Cite this

@article{cf7c14552cc540dca378a3c774511039,

title = "The application of three-dimensional atom probe analysis to GMR materials",

abstract = "Three-dimensional atom probe analysis to giant magnetoresistance (GMR) materials was discussed. Interdiffison or interface segregation at the atomic level were studied. It was found that this technique is capable of characterizing internal interfaces with sub-nanometer-scale topological features.",

author = "Petford-Long, {A. K.} and Larson, {D. J.} and A. Cerezo",

year = "2003",

month = oct,

day = "1",

language = "English (US)",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Intermag 2003: International Magnetics Conference ; Conference date: 28-03-2003 Through 03-04-2003",

}

TY - JOUR

T1 - The application of three-dimensional atom probe analysis to GMR materials

AU - Petford-Long, A. K.

AU - Larson, D. J.

AU - Cerezo, A.

PY - 2003/10/1

Y1 - 2003/10/1

N2 - Three-dimensional atom probe analysis to giant magnetoresistance (GMR) materials was discussed. Interdiffison or interface segregation at the atomic level were studied. It was found that this technique is capable of characterizing internal interfaces with sub-nanometer-scale topological features.

AB - Three-dimensional atom probe analysis to giant magnetoresistance (GMR) materials was discussed. Interdiffison or interface segregation at the atomic level were studied. It was found that this technique is capable of characterizing internal interfaces with sub-nanometer-scale topological features.

UR - http://www.scopus.com/inward/record.url?scp=0141679426&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0141679426&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0141679426

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

SN - 0074-6843

T2 - Intermag 2003: International Magnetics Conference

Y2 - 28 March 2003 through 3 April 2003

ER -

The application of three-dimensional atom probe analysis to GMR materials

Abstract

ASJC Scopus subject areas

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