The application of three-dimensional atom probe analysis to GMR materials

A. K. Petford-Long*, D. J. Larson, A. Cerezo

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

Three-dimensional atom probe analysis to giant magnetoresistance (GMR) materials was discussed. Interdiffison or interface segregation at the atomic level were studied. It was found that this technique is capable of characterizing internal interfaces with sub-nanometer-scale topological features.

Original languageEnglish (US)
JournalDigests of the Intermag Conference
StatePublished - Oct 1 2003
EventIntermag 2003: International Magnetics Conference - Boston, MA, United States
Duration: Mar 28 2003Apr 3 2003

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'The application of three-dimensional atom probe analysis to GMR materials'. Together they form a unique fingerprint.

Cite this