The Chemical Vapor Deposition of Polycrystalline InP

Masahide Inuishi; Bruce W. Wessels

doi:10.1149/1.2129584

The Chemical Vapor Deposition of Polycrystalline InP

Masahide Inuishi, Bruce W. Wessels

MRC - Materials Research Center

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Original language	English (US)
Pages (from-to)	2747-2750
Number of pages	4
Journal	Journal of the Electrochemical Society
Volume	127
Issue number	12
DOIs	https://doi.org/10.1149/1.2129584
State	Published - Dec 1980

Keywords

polycrystalline semiconductors
thin films

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Materials Chemistry
Surfaces, Coatings and Films
Electrochemistry
Renewable Energy, Sustainability and the Environment

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1149/1.2129584

Cite this

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title = "The Chemical Vapor Deposition of Polycrystalline InP",

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author = "Masahide Inuishi and Wessels, {Bruce W.}",

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volume = "127",

pages = "2747--2750",

journal = "Journal of the Electrochemical Society",

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publisher = "Electrochemical Society, Inc.",

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T1 - The Chemical Vapor Deposition of Polycrystalline InP

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AU - Wessels, Bruce W.

PY - 1980/12

Y1 - 1980/12

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KW - thin films

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JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

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The Chemical Vapor Deposition of Polycrystalline InP

Keywords

ASJC Scopus subject areas

UN SDGs

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