The Effect of Microstructure Morphology on Indentation Response of Ta/Ti Nanocomposite Thin Films

Ian McCue*, Sisi Xiang, Kelvin Xie, Michael J. Demkowicz

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

We investigated the indentation response of Ta/Ti nanocomposite thin films with widely differing morphologies of the constituent phases, ranging from particulate to bicontinuously interpenetrating, but comparable characteristic dimensions of microstructure features. We find no influence of microstructure morphology on stiffness or hardness. However, we see a systematic dependence of indentation pileup height on microstructure morphology, with the largest pileups observed in composites with connected, Ta-rich networks and lowest for highly connected, Ti-rich networks. We attribute this dependence to an influence of microstructure morphology on strain hardening rates and propose mechanisms to explain it.

Original languageEnglish (US)
Pages (from-to)5677-5690
Number of pages14
JournalMetallurgical and Materials Transactions A: Physical Metallurgy and Materials Science
Volume51
Issue number11
DOIs
StatePublished - Nov 1 2020

Funding

This work was supported by the NSF DMREF program under Grant #1623051. We thank J. K. Baldwin for thin-film deposition and both G. Pharr and B. Crawford for helpful discussions regarding indentation pileup and the impact of an underlying substrate. This work was performed, in part, at the Center for Integrated Nanotechnologies, an Office of Science User Facility operated for the U.S. Department of Energy (DOE) Office of Science. Use of the TAMU Materials Characterization Facility is acknowledged.

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys

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