The effect of sputter deposition conditions on the growth mechanism of YBa₂Cu₃O_7-delta thin films studied by scanning tunnelling microscopy

Keyphrases

• A-axis 33%
• Ambient Temperature 33%
• As-grown 33%
• C-axis 66%
• Cell Height 33%
• Crystalline Structure 33%
• Deposition Conditions 100%
• Deposition Temperature 33%
• Directly Observed 33%
• Grain Orientation 33%
• Growth Mechanism 100%
• Growth Steps 33%
• Normal Position 33%
• Oxides 33%
• RF Magnetron Sputtering 33%
• Sampling Distance 33%
• Scanning Mode 33%
• Scanning Tunneling Microscopy 100%
• Scanning Tunneling Spectroscopy 66%
• Screw Dislocation 33%
• Semiconducting Layer 33%
• Spiral Shape 33%
• Sputter Deposition 100%
• SrTiO3 Single Crystal 33%
• Step Height 33%
• Superconducting Gap 33%
• Surface Layer 33%
• Surface Topography 33%
• Surface Zone 33%
• Terraces 33%
• Tunneling Spectra 33%
• YBa2Cu3O7-δ Thin Film 100%
• YBCO Film 33%

Material Science

• Crystal Structure 20%
• Film 80%
• Magnesium Oxide 20%
• Magnetron Sputtering 20%
• Oxide Compound 20%
• Scanning Tunneling Microscopy 100%
• Screw Dislocation 20%
• Single Crystal 20%
• Sputter Deposition 100%
• Surface (Surface Science) 60%
• Surface Topography 20%
• Thin Films 100%