The effect of the reactant gas on YBa2Cu3Ox film formation

D. B. Buchholz; P. R. Markworth; J. A. Belot; T. J. Marks; R. P.H. Chang

doi:10.1016/S0254-0584(97)80254-4

The effect of the reactant gas on YBa₂Cu₃O_x film formation

D. B. Buchholz, P. R. Markworth, J. A. Belot, T. J. Marks, R. P.H. Chang^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

The reactant gas used as the deposition ambient has a large effect on the composition and properties of cuprate superconductor films. In this study YBa₂Cu₃O, thin films are deposited by pulsed organometallic beam epitaxy (POMBE). The barium precursor used contains fluorine and it is therefore possible to incorporate unwanted fluorine into the deposited film. For our deposition process both the fluorine content and oxygen content of the film are highly dependent on the reactant gas used as the deposition ambient. Many of the reaction conditions that remove fluorine also deplete the film of oxygen. In this study a set of reaction conditions that produce YBa₂Cu₂O_x films which are both fluorine-free and fully oxygenated are presented.

Original language	English (US)
Pages (from-to)	166-171
Number of pages	6
Journal	Materials Chemistry and Physics
Volume	50
Issue number	2
DOIs	https://doi.org/10.1016/S0254-0584(97)80254-4
State	Published - Sep 1997

Funding

The authors would like to thank Dave Brandel of AT&T Bell Laboratories for supplying the LaAlO, substrates. This work is supported by the Nation Science Foundation through the Science and Technology Center for Superconductivity under Grant DMR 9 l-20000.

Keywords

Film formation
Reactant gas
YBaCuO films

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics

Access to Document

10.1016/S0254-0584(97)80254-4

Cite this

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title = "The effect of the reactant gas on YBa2Cu3Ox film formation",

abstract = "The reactant gas used as the deposition ambient has a large effect on the composition and properties of cuprate superconductor films. In this study YBa2Cu3O, thin films are deposited by pulsed organometallic beam epitaxy (POMBE). The barium precursor used contains fluorine and it is therefore possible to incorporate unwanted fluorine into the deposited film. For our deposition process both the fluorine content and oxygen content of the film are highly dependent on the reactant gas used as the deposition ambient. Many of the reaction conditions that remove fluorine also deplete the film of oxygen. In this study a set of reaction conditions that produce YBa2Cu2Ox films which are both fluorine-free and fully oxygenated are presented.",

keywords = "Film formation, Reactant gas, YBaCuO films",

author = "Buchholz, {D. B.} and Markworth, {P. R.} and Belot, {J. A.} and Marks, {T. J.} and Chang, {R. P.H.}",

note = "Funding Information: The authors would like to thank Dave Brandel of AT&T Bell Laboratories for supplying the LaAlO, substrates. This work is supported by the Nation Science Foundation through the Science and Technology Center for Superconductivity under Grant DMR 9 l-20000.",

year = "1997",

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AU - Buchholz, D. B.

AU - Markworth, P. R.

AU - Belot, J. A.

AU - Marks, T. J.

AU - Chang, R. P.H.

N1 - Funding Information: The authors would like to thank Dave Brandel of AT&T Bell Laboratories for supplying the LaAlO, substrates. This work is supported by the Nation Science Foundation through the Science and Technology Center for Superconductivity under Grant DMR 9 l-20000.

PY - 1997/9

Y1 - 1997/9

N2 - The reactant gas used as the deposition ambient has a large effect on the composition and properties of cuprate superconductor films. In this study YBa2Cu3O, thin films are deposited by pulsed organometallic beam epitaxy (POMBE). The barium precursor used contains fluorine and it is therefore possible to incorporate unwanted fluorine into the deposited film. For our deposition process both the fluorine content and oxygen content of the film are highly dependent on the reactant gas used as the deposition ambient. Many of the reaction conditions that remove fluorine also deplete the film of oxygen. In this study a set of reaction conditions that produce YBa2Cu2Ox films which are both fluorine-free and fully oxygenated are presented.

AB - The reactant gas used as the deposition ambient has a large effect on the composition and properties of cuprate superconductor films. In this study YBa2Cu3O, thin films are deposited by pulsed organometallic beam epitaxy (POMBE). The barium precursor used contains fluorine and it is therefore possible to incorporate unwanted fluorine into the deposited film. For our deposition process both the fluorine content and oxygen content of the film are highly dependent on the reactant gas used as the deposition ambient. Many of the reaction conditions that remove fluorine also deplete the film of oxygen. In this study a set of reaction conditions that produce YBa2Cu2Ox films which are both fluorine-free and fully oxygenated are presented.

KW - Film formation

KW - Reactant gas

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