The effect of the reactant gas on YBa2Cu3Ox film formation

D. B. Buchholz, P. R. Markworth, J. A. Belot, T. J. Marks, R. P.H. Chang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


The reactant gas used as the deposition ambient has a large effect on the composition and properties of cuprate superconductor films. In this study YBa2Cu3O, thin films are deposited by pulsed organometallic beam epitaxy (POMBE). The barium precursor used contains fluorine and it is therefore possible to incorporate unwanted fluorine into the deposited film. For our deposition process both the fluorine content and oxygen content of the film are highly dependent on the reactant gas used as the deposition ambient. Many of the reaction conditions that remove fluorine also deplete the film of oxygen. In this study a set of reaction conditions that produce YBa2Cu2Ox films which are both fluorine-free and fully oxygenated are presented.

Original languageEnglish (US)
Pages (from-to)166-171
Number of pages6
JournalMaterials Chemistry and Physics
Issue number2
StatePublished - Sep 1997


  • Film formation
  • Reactant gas
  • YBaCuO films

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics


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