The influence of lead underpotential deposition on the capacitance of the silver-aqueous interface

Joseph T. Hupp, D. Larkin*, Michael J. Weaver

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Scopus citations


The differential capacitance of electrodcs formed by the underpotential deposition of lead at a polycrystalline silver substrate in contact with aqueous sodium perchlorate media has been studied in order to assess the influence of the surface atomic layer of the electrode in comparison with that of the underlying bulk metal. A novel method for preparing such surfaces using very dilute lead solutions and a rotating disk electrode was developed whereby the coverage of the resulting lead layers remained constant in situ over a wide potential range for long time periods in quiescent solution. It was found that lead layers on silver having coverages in the vicinity of a monolayer and beyond exhibited double-layer properties that were very similar to those for polycrystalline lead electrodes, and markedly different to those for clean silver. This suggests that the surface atomic layer provides the predominant influence upon the double-layer structure. The virtues of employing underpotential-deposited metal films in exploring the influences of the metal surface upon the interfacial structure are pointed out.

Original languageEnglish (US)
Pages (from-to)299-307
Number of pages9
JournalJournal of Electroanalytical Chemistry
Issue numberC
StatePublished - Jan 8 1982

ASJC Scopus subject areas

  • Analytical Chemistry
  • Chemical Engineering(all)
  • Electrochemistry


Dive into the research topics of 'The influence of lead underpotential deposition on the capacitance of the silver-aqueous interface'. Together they form a unique fingerprint.

Cite this