The molecular beam epitaxial growth of InSb on (111)B GaAs

E. Michel*, J. D. Kim, S. Javadpour, J. Xu, I. Ferguson, M. Razeghi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

The molecular beam epitaxial growth of InSb on (111)B GaAs has been investigated. It was found that for a given Sb/In ratio, a higher growth temperature was required for the growth of InSb on (111)B GaAs compared to that on (001) GaAs. This difference has been attributed to the bonding characteristics of the (111)B and (001) surface. Once growth had been optimized, it was found that the material characteristics of (111)B InSb were almost identical to that of (001) InSb, i.e., independent of orientation. For example, the x-ray full width at half-maximum and 300 K mobility had the same absolute values for (111) InSb and (001) InSb and followed the same dependence with the sample thickness. Te was found to be a well-behaved n-type dopant for (111)B InSb.

Original languageEnglish (US)
Pages (from-to)215-217
Number of pages3
JournalApplied Physics Letters
Volume69
Issue number2
DOIs
StatePublished - Jul 8 1996

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'The molecular beam epitaxial growth of InSb on (111)B GaAs'. Together they form a unique fingerprint.

Cite this