The Origin of Lower Hole Carrier Concentration in Methylammonium Tin Halide Films Grown by a Vapor-Assisted Solution Process

Takamichi Yokoyama, Tze Bin Song, Duyen H. Cao, Constantinos C. Stoumpos, Shinji Aramaki, Mercouri G. Kanatzidis*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

91 Scopus citations

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Material Science