TY - JOUR
T1 - The role of ion/surface interactions and photo-induced reactions during film growth from the vapor phase
AU - Greene, J. E.
AU - Motooka, T.
AU - Sundgren, J. E.
AU - Lubben, D.
AU - Gorbatkin, S.
AU - Barnett, S. A.
N1 - Funding Information:
The authors gratefully acknowledge the financial support of the Joint Services Electronics Program under contract number N0014-84-C-0149, the Materials Science Division of the Department of Energy under contract number DE-AC02-76ER01198, the Semiconductor Research Corporation, and the Office of Naval Research under contract number N00014-18-K-0568 in sponsoring various phases of this work. One of the authors (J.E.G.) would also like to express a special debt of gratitude to Dr. G. Wright. Physics Division, ONR, for support in initiating research programs in both ion/surface interactions and photochemical film growth, for guidance, critisism, and encouragement over the years, and for introductions to scientists, working in quite different fields, which have led to interactions that have contributed significantly to our program.
PY - 1987/6/2
Y1 - 1987/6/2
N2 - Recent progress in the understanding of mechanisms associated with low-energy (often < 100 eV) ion/surface interactions and photo-induced reactions during vapor-phase crystal growth are reviewed. Ion/surface interactions play an important role in a variety of deposition technologies including sputtering, plasma-assisted chemical vapor deposition, and, more recently, molecular beam epitaxy. Effects such as trapping, preferential sputtering, and collisional mixing are used to interpret and, in some cases, model experimental results concerning the effects of low-energy ion bombardment on nucleation and film growth kinetics, the evolution of film microstructure, elemental incorporation probabilities, surface segregation rates, and dopant depth distributions. The role of photo-stimulated gas-phase and surface reactions during laser-assisted chemical vapor deposition, including single, multiple, and multiphoton-initiated processes, radical production, and adlayer photochemistry, are also discussed together with newly developed laser-processing techniques during deposition. The focus of this review is on the development of an understanding of the controlling mechanisms in both ion/surface and photo-stimulated processes.
AB - Recent progress in the understanding of mechanisms associated with low-energy (often < 100 eV) ion/surface interactions and photo-induced reactions during vapor-phase crystal growth are reviewed. Ion/surface interactions play an important role in a variety of deposition technologies including sputtering, plasma-assisted chemical vapor deposition, and, more recently, molecular beam epitaxy. Effects such as trapping, preferential sputtering, and collisional mixing are used to interpret and, in some cases, model experimental results concerning the effects of low-energy ion bombardment on nucleation and film growth kinetics, the evolution of film microstructure, elemental incorporation probabilities, surface segregation rates, and dopant depth distributions. The role of photo-stimulated gas-phase and surface reactions during laser-assisted chemical vapor deposition, including single, multiple, and multiphoton-initiated processes, radical production, and adlayer photochemistry, are also discussed together with newly developed laser-processing techniques during deposition. The focus of this review is on the development of an understanding of the controlling mechanisms in both ion/surface and photo-stimulated processes.
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U2 - 10.1016/0168-583X(87)90024-3
DO - 10.1016/0168-583X(87)90024-3
M3 - Article
AN - SCOPUS:0022733014
VL - 27
SP - 226
EP - 242
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
SN - 0168-583X
IS - 1
ER -