Abstract
Structural and magnetic characterizations have been performed on NiFe-FeMn exchange-biased bilayers grown by molecular beam epitaxy. The growth of the films showed high-quality epitaxy with well-defined flat interface between the layers. Magnetic measurements confirmed that the films showed not only a comparable exchange anisotropy field (Hex) to that of sputtered films but also a lowered threshold thickness of 2 nm at which Hex vanishes for the FeMn.
Original language | English (US) |
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Pages (from-to) | 2758-2760 |
Number of pages | 3 |
Journal | IEEE Transactions on Magnetics |
Volume | 38 |
Issue number | 5 I |
DOIs | |
State | Published - Sep 1 2002 |
Event | 2002 International Magnetics Conference (Intermag 2002) - Amsterdam, Netherlands Duration: Apr 28 2002 → May 2 2002 |
Keywords
- Exchange anisotropy
- Magnetic characterization
- Molecular beam epitaxy
- Structural characterization
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering