The structural and magnetic characterization of molecular-beam-epitaxy-grown FeMn-NiFe exchange-biased bilayers

Young Suk Choi; Amanda K. Petford-Long; Roger C C Ward

doi:10.1109/TMAG.2002.802856

The structural and magnetic characterization of molecular-beam-epitaxy-grown FeMn-NiFe exchange-biased bilayers

Young Suk Choi^*, Amanda K. Petford-Long, Roger C C Ward

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

8 Scopus citations

Abstract

Structural and magnetic characterizations have been performed on NiFe-FeMn exchange-biased bilayers grown by molecular beam epitaxy. The growth of the films showed high-quality epitaxy with well-defined flat interface between the layers. Magnetic measurements confirmed that the films showed not only a comparable exchange anisotropy field (H_ex) to that of sputtered films but also a lowered threshold thickness of 2 nm at which H_ex vanishes for the FeMn.

Original language	English (US)
Pages (from-to)	2758-2760
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	38
Issue number	5 I
DOIs	https://doi.org/10.1109/TMAG.2002.802856
State	Published - Sep 1 2002
Event	2002 International Magnetics Conference (Intermag 2002) - Amsterdam, Netherlands Duration: Apr 28 2002 → May 2 2002

Keywords

Exchange anisotropy
Magnetic characterization
Molecular beam epitaxy
Structural characterization

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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title = "The structural and magnetic characterization of molecular-beam-epitaxy-grown FeMn-NiFe exchange-biased bilayers",

abstract = "Structural and magnetic characterizations have been performed on NiFe-FeMn exchange-biased bilayers grown by molecular beam epitaxy. The growth of the films showed high-quality epitaxy with well-defined flat interface between the layers. Magnetic measurements confirmed that the films showed not only a comparable exchange anisotropy field (Hex) to that of sputtered films but also a lowered threshold thickness of 2 nm at which Hex vanishes for the FeMn.",

keywords = "Exchange anisotropy, Magnetic characterization, Molecular beam epitaxy, Structural characterization",

author = "Choi, {Young Suk} and Petford-Long, {Amanda K.} and Ward, {Roger C C}",

year = "2002",

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doi = "10.1109/TMAG.2002.802856",

language = "English (US)",

volume = "38",

pages = "2758--2760",

journal = "IEEE Transactions on Magnetics",

issn = "0018-9464",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "5 I",

note = "2002 International Magnetics Conference (Intermag 2002) ; Conference date: 28-04-2002 Through 02-05-2002",

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T1 - The structural and magnetic characterization of molecular-beam-epitaxy-grown FeMn-NiFe exchange-biased bilayers

AU - Choi, Young Suk

AU - Petford-Long, Amanda K.

AU - Ward, Roger C C

PY - 2002/9/1

Y1 - 2002/9/1

N2 - Structural and magnetic characterizations have been performed on NiFe-FeMn exchange-biased bilayers grown by molecular beam epitaxy. The growth of the films showed high-quality epitaxy with well-defined flat interface between the layers. Magnetic measurements confirmed that the films showed not only a comparable exchange anisotropy field (Hex) to that of sputtered films but also a lowered threshold thickness of 2 nm at which Hex vanishes for the FeMn.

AB - Structural and magnetic characterizations have been performed on NiFe-FeMn exchange-biased bilayers grown by molecular beam epitaxy. The growth of the films showed high-quality epitaxy with well-defined flat interface between the layers. Magnetic measurements confirmed that the films showed not only a comparable exchange anisotropy field (Hex) to that of sputtered films but also a lowered threshold thickness of 2 nm at which Hex vanishes for the FeMn.

KW - Exchange anisotropy

KW - Magnetic characterization

KW - Molecular beam epitaxy

KW - Structural characterization

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JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

SN - 0018-9464

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T2 - 2002 International Magnetics Conference (Intermag 2002)

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