Abstract
A heteroepitaxial structure consisting of 1 ML InAs grown on GaAs(0 0 1) and then capped with 25 Å GaAs was examined by the X-ray standing wave (XSW) method. By monitoring the In L fluorescence while scanning through the GaAs(0 0 4) Bragg reflection, the perpendicular strain within the InAs layer was directly measured to be 7.7%, which is in good agreement with macroscopic elasticity theory (7.3%). We also demonstrate that, combined with the evanescent-wave-emission effect, the XSW method can be used to measure the strain-induced displacement of the cap layer in the growth direction.
Original language | English (US) |
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Pages (from-to) | 437-444 |
Number of pages | 8 |
Journal | Physica B: Condensed Matter |
Volume | 221 |
Issue number | 1-4 |
DOIs | |
State | Published - Apr 2 1996 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering