Theory of Ostwald ripening due to a second-order reaction

L. Ratke, D. Uffelmann, W. Bender, Peter W Voorhees

Research output: Contribution to journalArticle

7 Scopus citations

Abstract

The theoretical analysis of Ostwald ripening for coarsening of a dispersion of particles by a second-order interfacial reaction at the particle-matrix interface revealed: in the case of a simple second-order interfacial reaction the mean particle size increases as t 1 3, the same as that for a diffusion controlled coarsening process. However, the stationary normalized particle size distribution has a large cut-off radius of 3, and is clearly distinguishable from the cases of pure diffusion controlled coarsening and first-order interfacial reaction controlled coarsening.

Original languageEnglish (US)
Pages (from-to)363-367
Number of pages5
JournalScripta Metallurgica et Materiala
Volume33
Issue number3
DOIs
StatePublished - Aug 1 1995

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