Theory of Ostwald ripening due to a second-order reaction

L. Ratke; D. Uffelmann; W. Bender; P. W. Voorhees

doi:10.1016/0956-716X(95)00223-I

Theory of Ostwald ripening due to a second-order reaction

L. Ratke, D. Uffelmann, W. Bender, P. W. Voorhees

Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

The theoretical analysis of Ostwald ripening for coarsening of a dispersion of particles by a second-order interfacial reaction at the particle-matrix interface revealed: in the case of a simple second-order interfacial reaction the mean particle size increases as t 1 3, the same as that for a diffusion controlled coarsening process. However, the stationary normalized particle size distribution has a large cut-off radius of 3, and is clearly distinguishable from the cases of pure diffusion controlled coarsening and first-order interfacial reaction controlled coarsening.

Original language	English (US)
Pages (from-to)	363-367
Number of pages	5
Journal	Scripta Metallurgica et Materiala
Volume	33
Issue number	3
DOIs	https://doi.org/10.1016/0956-716X(95)00223-I
State	Published - Aug 1 1995

ASJC Scopus subject areas

General Engineering

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abstract = "The theoretical analysis of Ostwald ripening for coarsening of a dispersion of particles by a second-order interfacial reaction at the particle-matrix interface revealed: in the case of a simple second-order interfacial reaction the mean particle size increases as t 1 3, the same as that for a diffusion controlled coarsening process. However, the stationary normalized particle size distribution has a large cut-off radius of 3, and is clearly distinguishable from the cases of pure diffusion controlled coarsening and first-order interfacial reaction controlled coarsening.",

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AU - Ratke, L.

AU - Uffelmann, D.

AU - Bender, W.

AU - Voorhees, P. W.

PY - 1995/8/1

Y1 - 1995/8/1

N2 - The theoretical analysis of Ostwald ripening for coarsening of a dispersion of particles by a second-order interfacial reaction at the particle-matrix interface revealed: in the case of a simple second-order interfacial reaction the mean particle size increases as t 1 3, the same as that for a diffusion controlled coarsening process. However, the stationary normalized particle size distribution has a large cut-off radius of 3, and is clearly distinguishable from the cases of pure diffusion controlled coarsening and first-order interfacial reaction controlled coarsening.

AB - The theoretical analysis of Ostwald ripening for coarsening of a dispersion of particles by a second-order interfacial reaction at the particle-matrix interface revealed: in the case of a simple second-order interfacial reaction the mean particle size increases as t 1 3, the same as that for a diffusion controlled coarsening process. However, the stationary normalized particle size distribution has a large cut-off radius of 3, and is clearly distinguishable from the cases of pure diffusion controlled coarsening and first-order interfacial reaction controlled coarsening.

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Theory of Ostwald ripening due to a second-order reaction

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