Dip-pen nanolithography (DPN) uses scanning probes to directly deposit chemical and biological materials on a solid substrate. It offers the advantages of nanometer resolution and flexibility in pattern generation. Conventional DPN uses a single probe and its throughput is limited due to the serial nature of the process. This article reports the development of a linear silicon probe array that enables parallel DPN writing with improved throughput. The probe array has ten probes with tips with 100 nm radius of curvature. Each probe in the array is individually controllable by a bimorph thermal actuator on its cantilever. DPN writing tests with octadecanethiol (ODT) as ink on gold surface have been conducted on an atomic force microscope. Simultaneous generation of ten different ODT patterns has been achieved with an average linewidth of 40 nm.
|Original language||English (US)|
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Nov 2004|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering