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Thermomechanically induced voiding of Al-Cu thin films
Charles S. Whitman,
Yip Wah Chung
CCSS - Center for Catalysis and Surface Science
MRC - Materials Research Center
Research output
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Contribution to journal
›
Article
›
peer-review
3
Scopus citations
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Material Science
Thin Films
100%
Surface Diffusion
100%
Residual Stress
100%
Thermal Cycling
100%
Electronic Circuit
100%
Fracture Mechanics
100%
Grain Boundary
100%
Thermal Expansion
100%
INIS
thin films
100%
failures
100%
testing
33%
surfaces
33%
comparative evaluations
33%
reviews
33%
prediction
33%
diffusion
33%
integrated circuits
33%
grain boundaries
33%
residual stresses
33%
fracture mechanics
33%
thermal cycling
33%
thermal expansion
33%
Physics
Thin Films
100%
Failure
100%
Fracture Mechanics
33%
Integrated Circuit
33%
Thermal Expansion
33%
Grain Boundaries
33%