Three dimensional atom probe and field ion microscopy analysis of Co/Pd multilayers for perpendicular media applications

Y. Q. Ma; A. K. Petford-Long; A. Cerezo; D. J. Larson; T. P. Nolan

Three dimensional atom probe and field ion microscopy analysis of Co/Pd multilayers for perpendicular media applications

Y. Q. Ma^*, A. K. Petford-Long, A. Cerezo, D. J. Larson, T. P. Nolan

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

The three dimensional atom probe and field ion microscopy analysis of Co/ Pd multilayers for perpendicular media applications were discussed. A series of multilayer films, seeded with a Ti-based bilayer seed, were deposited on Si wafers. The atomic scale composition distribution was characterized using 3DAP and was used to characterize the structure of the films.

Original language	English (US)
Pages (from-to)	HA03
Journal	Digests of the Intermag Conference
State	Published - Oct 1 2003
Event	Intermag 2003: International Magnetics Conference - Boston, MA, United States Duration: Mar 28 2003 → Apr 3 2003

ASJC Scopus subject areas

Electrical and Electronic Engineering

Cite this

@article{44a690e61dea4c4ead545eee60115d99,

title = "Three dimensional atom probe and field ion microscopy analysis of Co/Pd multilayers for perpendicular media applications",

abstract = "The three dimensional atom probe and field ion microscopy analysis of Co/ Pd multilayers for perpendicular media applications were discussed. A series of multilayer films, seeded with a Ti-based bilayer seed, were deposited on Si wafers. The atomic scale composition distribution was characterized using 3DAP and was used to characterize the structure of the films.",

author = "Ma, {Y. Q.} and Petford-Long, {A. K.} and A. Cerezo and Larson, {D. J.} and Nolan, {T. P.}",

year = "2003",

month = oct,

day = "1",

language = "English (US)",

pages = "HA03",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Intermag 2003: International Magnetics Conference ; Conference date: 28-03-2003 Through 03-04-2003",

}

TY - JOUR

T1 - Three dimensional atom probe and field ion microscopy analysis of Co/Pd multilayers for perpendicular media applications

AU - Ma, Y. Q.

AU - Petford-Long, A. K.

AU - Cerezo, A.

AU - Larson, D. J.

AU - Nolan, T. P.

PY - 2003/10/1

Y1 - 2003/10/1

N2 - The three dimensional atom probe and field ion microscopy analysis of Co/ Pd multilayers for perpendicular media applications were discussed. A series of multilayer films, seeded with a Ti-based bilayer seed, were deposited on Si wafers. The atomic scale composition distribution was characterized using 3DAP and was used to characterize the structure of the films.

AB - The three dimensional atom probe and field ion microscopy analysis of Co/ Pd multilayers for perpendicular media applications were discussed. A series of multilayer films, seeded with a Ti-based bilayer seed, were deposited on Si wafers. The atomic scale composition distribution was characterized using 3DAP and was used to characterize the structure of the films.

UR - http://www.scopus.com/inward/record.url?scp=0141676953&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0141676953&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0141676953

SN - 0074-6843

SP - HA03

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

T2 - Intermag 2003: International Magnetics Conference

Y2 - 28 March 2003 through 3 April 2003

ER -

Three dimensional atom probe and field ion microscopy analysis of Co/Pd multilayers for perpendicular media applications

Abstract

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this