Three-dimensional atom probe studies of metallic multilayers

D. J. Larson; A. K. Petford-Long; A. Cerezo; G. D W Smith

doi:10.1016/S1359-6454(99)00284-0

Three-dimensional atom probe studies of metallic multilayers

D. J. Larson^*, A. K. Petford-Long, A. Cerezo, G. D W Smith

^*Corresponding author for this work

Materials Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

43 Scopus citations

Abstract

Multilayer film structures which exhibit giant magnetoresistance have applications in the areas of magnetic recording and computer memory. The magnetic properties of these structures are highly dependent upon atomic level structural and compositional variations. Thus, structural characterization with extremely high spatial resolution, especially at the interfaces, is very important in order to optimize the performance of these devices with respect to processing and operating conditions. Field-ion microscopy and three-dimensional atom probe microanalysis have been used to characterize the interfaces and grain boundaries in a structure containing 100 repetitions of a (Cu_{2 nm}/Co_{2 nm}) bilayer. Analyses show layer alloying, a high degree of layer curvature (particularly close to grain boundaries) and regions where cobalt layers are in contact. In addition, atomic scale analysis of the interface between copper and cobalt layers indicates that atomic planes are coherent from one layer to the next.

Original language	English (US)
Pages (from-to)	4019-4024
Number of pages	6
Journal	Acta Materialia
Volume	47
Issue number	15
DOIs	https://doi.org/10.1016/S1359-6454(99)00284-0
State	Published - Nov 1999
Event	Proceedings of the 1998 ACTA Materiala Workshop on 'Materials Science and Mechanics of Interfaces' - La Jolla, CA, USA Duration: Oct 25 1998 → Oct 30 1998

Funding

The authors would like to thank B. Cantor for the provision of laboratory space, D. T. Foord, University of Cambridge, for assistance with focused ion-beam milling, E. A. Kenik of Oak Ridge National Laboratory (ORNL) for assistance with scanning electron microscopy, T. J. Godfrey for technical assistance, P. J. Warren and M. Huang for helpful discussions and T. C. Anthony of Hewlett Packard for provision of the Cu/Co multilayer devices, which were provided as part of a collaborative project with the University of Oxford. The authors would like to acknowledge use of facilities at ORNL, sponsored by the Division of Materials Sciences, U.S. Department of Energy, under contract DE-AC05-96OR22464 with Lockheed Martin Energy Research Corp., during the preparation of this manuscript. This research was sponsored by the U.S. National Science Foundation under Grant No. INT-9600327 (D.J.L.) and by The Royal Society (A.K.P.L.).

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Polymers and Plastics
Metals and Alloys

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10.1016/S1359-6454(99)00284-0

Cite this

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title = "Three-dimensional atom probe studies of metallic multilayers",

abstract = "Multilayer film structures which exhibit giant magnetoresistance have applications in the areas of magnetic recording and computer memory. The magnetic properties of these structures are highly dependent upon atomic level structural and compositional variations. Thus, structural characterization with extremely high spatial resolution, especially at the interfaces, is very important in order to optimize the performance of these devices with respect to processing and operating conditions. Field-ion microscopy and three-dimensional atom probe microanalysis have been used to characterize the interfaces and grain boundaries in a structure containing 100 repetitions of a (Cu2 nm/Co2 nm) bilayer. Analyses show layer alloying, a high degree of layer curvature (particularly close to grain boundaries) and regions where cobalt layers are in contact. In addition, atomic scale analysis of the interface between copper and cobalt layers indicates that atomic planes are coherent from one layer to the next.",

author = "Larson, {D. J.} and Petford-Long, {A. K.} and A. Cerezo and Smith, {G. D W}",

note = "Funding Information: The authors would like to thank B. Cantor for the provision of laboratory space, D. T. Foord, University of Cambridge, for assistance with focused ion-beam milling, E. A. Kenik of Oak Ridge National Laboratory (ORNL) for assistance with scanning electron microscopy, T. J. Godfrey for technical assistance, P. J. Warren and M. Huang for helpful discussions and T. C. Anthony of Hewlett Packard for provision of the Cu/Co multilayer devices, which were provided as part of a collaborative project with the University of Oxford. The authors would like to acknowledge use of facilities at ORNL, sponsored by the Division of Materials Sciences, U.S. Department of Energy, under contract DE-AC05-96OR22464 with Lockheed Martin Energy Research Corp., during the preparation of this manuscript. This research was sponsored by the U.S. National Science Foundation under Grant No. INT-9600327 (D.J.L.) and by The Royal Society (A.K.P.L.). ; Proceedings of the 1998 ACTA Materiala Workshop on 'Materials Science and Mechanics of Interfaces' ; Conference date: 25-10-1998 Through 30-10-1998",

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N2 - Multilayer film structures which exhibit giant magnetoresistance have applications in the areas of magnetic recording and computer memory. The magnetic properties of these structures are highly dependent upon atomic level structural and compositional variations. Thus, structural characterization with extremely high spatial resolution, especially at the interfaces, is very important in order to optimize the performance of these devices with respect to processing and operating conditions. Field-ion microscopy and three-dimensional atom probe microanalysis have been used to characterize the interfaces and grain boundaries in a structure containing 100 repetitions of a (Cu2 nm/Co2 nm) bilayer. Analyses show layer alloying, a high degree of layer curvature (particularly close to grain boundaries) and regions where cobalt layers are in contact. In addition, atomic scale analysis of the interface between copper and cobalt layers indicates that atomic planes are coherent from one layer to the next.

AB - Multilayer film structures which exhibit giant magnetoresistance have applications in the areas of magnetic recording and computer memory. The magnetic properties of these structures are highly dependent upon atomic level structural and compositional variations. Thus, structural characterization with extremely high spatial resolution, especially at the interfaces, is very important in order to optimize the performance of these devices with respect to processing and operating conditions. Field-ion microscopy and three-dimensional atom probe microanalysis have been used to characterize the interfaces and grain boundaries in a structure containing 100 repetitions of a (Cu2 nm/Co2 nm) bilayer. Analyses show layer alloying, a high degree of layer curvature (particularly close to grain boundaries) and regions where cobalt layers are in contact. In addition, atomic scale analysis of the interface between copper and cobalt layers indicates that atomic planes are coherent from one layer to the next.

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Three-dimensional atom probe studies of metallic multilayers

Abstract

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