Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography

D. Shir, E. C. Nelson, Y. C. Chen, A. Brzezinski, H. Liao, P. V. Braun, P. Wiltzius, K. H A Bogart, J. A. Rogers

Research output: Contribution to journalArticlepeer-review

48 Scopus citations

Abstract

We describe the fabrication of silicon three dimensional photonic crystals using polymer templates defined by a single step, two-photon exposure through a layer of photopolymer with relief molded on its surface. The resulting crystals exhibit high structural quality over large areas, displaying geometries consistent with calculation. Spectroscopic measurements of transmission and reflection through the silicon and polymer structures reveal excellent optical properties, approaching properties predicted by simulations that assume ideal layouts.

Original languageEnglish (US)
Article number011101
JournalApplied Physics Letters
Volume94
Issue number1
DOIs
StatePublished - 2009

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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