Tilted exposure microsphere nanolithography for high-throughput and mask-less fabrication of plasmonic molecules

Keyphrases

• Chiral Response 50%
• Dielectric Characteristics 50%
• Extreme Ultraviolet Lithography 50%
• Fano 50%
• FDTD Simulation 50%
• Gap Size 50%
• High-throughput 100%
• Limited Area 50%
• Lithography 50%
• Manufacturing Scheme 50%
• Mask-free 100%
• Metal-dielectric 50%
• Metamaterials 50%
• Microsphere Size 50%
• Nanofabrication 50%
• Nanogap 50%
• Nanoimprint Lithography 100%
• Nanostructures 50%
• Negative Refractive Index 50%
• Optical Element 50%
• Optical Field Enhancement 50%
• Optical Resonance 50%
• Periodic Array 50%
• Periodic Nanostructures 50%
• Photolithography Process 50%
• Photonic Jet 100%
• Plasmonic Molecules 100%
• Plasmonics 50%
• Production Area 50%
• Propagative 50%
• Resonant Response 50%
• Roll-to-roll Production 50%
• Self-aligned 50%
• Small Feature Size 50%
• Submicron 50%

Engineering

• Dielectrics 33%
• Experimental Result 33%
• Feature Size 100%
• Field Enhancement 33%
• Lithography 33%
• Microsphere 100%
• Nanolithography 100%
• Nanomaterial 66%
• Optical Element 33%
• Optical Field 33%
• Optical Lithography 66%
• Photonics 66%
• Plasmonics 100%
• Refractive Index 33%
• Refractivity 33%
• Smallest Feature 33%

Material Science

• Dielectric Material 33%
• Lithography 66%
• Metamaterials 33%
• Microsphere 100%
• Nanostructure 66%
• Refractive Index 33%