Abstract
We introduce a new fluorescence microscopy technique that maps the axial position of a fluorophore with subnanometer precision. The interference of the emission of fluorophores in proximity to a reflecting surface results in fringes in the fluorescence spectrum that provide a unique signature of the axial position of the fluorophore. The nanometer sensitivity is demonstrated by measuring the height of a fluorescein monolayer covering a 12-nm step etched in silicon dioxide. In addition, the separation between fluorophores attached to the top or the bottom layer in a lipid bilayer film is determined. We further discuss extension of this microscopy technique to provide resolution of multiple layers spaced as closely as 10 nm for sparse systems.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 294-300 |
| Number of pages | 7 |
| Journal | IEEE Journal on Selected Topics in Quantum Electronics |
| Volume | 9 |
| Issue number | 2 |
| DOIs | |
| State | Published - Mar 2003 |
Funding
Manuscript received December 11, 2002; revised February 10, 2003. This work was supported in part by the National Science Foundation under Grant DBI-0128425 and in part by Corning, Inc.
Keywords
- Fluorescence microscopy
- Interference
- Spectroscopy
- Ultra high-optical resolution
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering